Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ELANE | P08246 | 3/20 | 0.66 |
| ▸ | CTSG | P08311 | 1/20 | 0.55 |
| ▸ | L3MBTL1 | Q9Y468 | 4/20 | 0.49 |
| ▸ | MAPT | P10636 | 3/20 | 0.49 |
| ▸ | TDP1 | Q9NUW8 | 3/20 | 0.49 |
| ▸ | MAPK1 | P28482 | 3/20 | 0.49 |
| ▸ | EGFR | P00533 | 2/20 | 0.49 |
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.49 |
| ▸ | PABPC1 | P11940 | 2/20 | 0.49 |
| ▸ | RAB9A | P51151 | 1/20 | 0.49 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.49 |
| ▸ | ADORA2A | P29274 | 1/20 | 0.48 |
| ▸ | PTPN1 | P18031 | 1/20 | 0.47 |
| ▸ | NPSR1 | Q6W5P4 | 1/20 | 0.47 |
| ▸ | MAOB | P27338 | 2/20 | 0.46 |
| ▸ | CYP1A2 | P05177 | 1/20 | 0.46 |
| ▸ | CYP2C9 | P11712 | 1/20 | 0.46 |
| ▸ | HIF1A | Q16665 | 1/20 | 0.46 |
| ▸ | MEN1 | O00255 | 2/20 | 0.44 |
| ▸ | KMT2A | Q03164 | 2/20 | 0.44 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL11882769 | 0.96 | ELANE (0.62) | ELANECTSGL3MBTL1MAPTTDP1 | |
| SCHEMBL13935792 | 0.96 | ELANE (0.60) | ELANECTSGL3MBTL1MAPTTDP1 | |
| SCHEMBL5347167 | 0.89 | ELANE (0.53) | ELANECTSGMAPTMAPK1ALDH1A1 | |
| SCHEMBL13935793 | 0.86 | ELANE (0.67) | ELANECTSGMAPTMAPK1RAB9A | |
| SCHEMBL11585452 | 0.84 | ELANE (0.51) | ELANECTSGL3MBTL1MAPTTDP1 | |
| SCHEMBL8931023 | 0.81 | ELANE (0.50) | ELANECTSGL3MBTL1MAPTTDP1 | |
| SCHEMBL2127216 | 0.81 | ELANE (0.69) | ELANECTSGL3MBTL1MAPTTDP1 | |
| SCHEMBL27486561 | 0.80 | ELANE (0.68) | ELANECTSGL3MBTL1MAPTTDP1 | |
| SCHEMBL27847287 | 0.79 | ELANE (0.57) | ELANECTSGL3MBTL1MAPTTDP1 | |
| SCHEMBL9213962 | 0.79 | ADORA2A (0.53) | ELANEL3MBTL1MAPTTDP1MAPK1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 112 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-0626431-B1 | PHOTOCURABLE CONDUCTIVE COATING COMPOSITION | SEKISUI CHEMICAL CO LTD (JP) | 2000-01-26 | — | — | EP | claimed |
| US-5429846-A | Antimony oxide-containing tin oxide powder, (meth) acrylate compound, acetal resin, photopolymerization initiator and organic solvent | SEKISUI CHEMICAL CO., LTD. (JP) | 1995-07-04 | — | — | US | claimed |
| EP-0626431-A1 | PHOTOCURABLE CONDUCTIVE COATING COMPOSITION | SEKISUI CHEMICAL CO., LTD. (JP) | 1994-11-30 | — | — | EP | claimed |
| CN-119556523-A | Photosensitive resin laminate and use thereof | 长春人造树脂厂股份有限公司 | 2025-03-04 | — | — | CN | disclosed |
| CN-117631439-A | Photoresist film and application thereof | 长春人造树脂厂股份有限公司 | 2024-03-01 | — | — | CN | disclosed |
| CN-110032042-B | Negative photoresist composition for laser ablation and method of use thereof | 默克专利有限公司 | 2022-05-27 | — | — | CN | disclosed |
| CN-108699212-B | Dual cure soft touch coating | 阿科玛法国公司 | 2021-10-15 | — | — | CN | disclosed |
| CN-108139670-B | Negative photoresist composition for laser ablation and method of use thereof | 默克专利有限公司 | 2021-07-09 | — | — | CN | disclosed |
| EP-2016464-B1 | NEGATIVE PHOTORESIST COMPOSITIONS | MERCK PATENT GMBH (DE) | 2021-04-28 | — | — | EP | disclosed |
| US-10705424-B2 | Negative-working photoresist compositions for laser ablation and use thereof | MERCK PATENT GMBH (DE) | 2020-07-07 | — | — | US | disclosed |
| EP-3394674-B1 | NEGATIVE-WORKING PHOTORESIST COMPOSITIONS FOR LASER ABLATION AND PROCESSES USING THEM | AZ ELECTRONIC MAT LUXEMBOURG SARL (LU) | 2020-05-06 | — | — | EP | disclosed |
| EP-0461651-A1 | Recording medium | FUJI PHOTO FILM CO., LTD. (JP) | 1991-12-18 | — | — | EP | disclosed |
| US-5039592-A | Photosensitive resin base material for making relief printing plates having a slip layer containing a blue anthroquinone | NIPPON PAINT CO., LTD. (JP) | 1991-08-13 | — | — | US | disclosed |
| EP-0412570-A2 | Light- and heat-sensitive recording material | FUJI PHOTO FILM CO., LTD. (JP) | 1991-02-13 | — | — | EP | disclosed |
| US-4756994-A | Ethylenically unsaturated monomer, photopolymerizable monomer, polymerization inhibitor, nitrogen-containing compound | SEKISUI KAGAKU KOGYO KABUSHIKI KAISHA (JP) | 1988-07-12 | — | — | US | disclosed |
| EP-0225676-A2 | Photosensitive resin base printing material | Nippon Paint Co., Ltd. (JP) | 1987-06-16 | — | — | EP | disclosed |
| EP-0206030-A2 | Photocurable composition | SEKISUI KAGAKU KOGYO KABUSHIKI KAISHA (JP) | 1986-12-30 | — | — | EP | disclosed |
| US-4629680-A | ACRYLATE-UNSATURATED CARBOXYLIC ACID COPOLYMER BINDER | FUJI PHOTO FILM CO., LTD. (JP) | 1986-12-16 | — | — | US | disclosed |
| EP-0068599-B1 | PHOTO-SENSITIVE RESIN MATERIAL | Nippon Paint Co., Ltd. (JP) | 1985-02-13 | — | — | EP | disclosed |
| US-4275143-A | METAL ACRYLATE CURABLE BINDER | NIPPON PAINT CO., LTD. (JP) | 1981-06-23 | — | — | US | disclosed |