SCHEMBL28704288

SCHEMBL28704288

OCCOc1cccc2c1C(c1ccccc1)c1ccccc1C2

nearest known ligand 0.47

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
HTR2A P28223 5/20 0.47
LMNA P02545 3/20 0.40
TP53 P04637 1/20 0.39
MAPK1 P28482 1/20 0.39
RAB9A P51151 1/20 0.39
HTT P42858 2/20 0.39
MEN1 O00255 1/20 0.38
KMT2A Q03164 1/20 0.38
HTR7 P34969 1/20 0.38
POLB P06746 2/20 0.37
KDM4E B2RXH2 3/20 0.37
ALDH1A1 P00352 2/20 0.37
SMN1; SMN2 Q16637 2/20 0.36
HTR1A P08908 1/20 0.36
ADRA1D P25100 1/20 0.36
ADRA1A P35348 1/20 0.36
ADRA1B P35368 1/20 0.36
HTR2C P28335 1/20 0.36
HRH1 P35367 1/20 0.36
ADRB2 P07550 1/20 0.36

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL22418784 0.76 HTR2A (0.43) HTR2ALMNATP53MAPK1ALDH1A1
SCHEMBL28579731 0.73 HTR2A (0.41) HTR2ALMNATP53HTR2CHRH1
SCHEMBL28546468 0.70 HTR2A (0.38) HTR2ALMNATP53MAPK1MEN1
SCHEMBL16883329 0.70 IDO1 (0.49) LMNATP53MAPK1RAB9AMEN1
SCHEMBL4604946 0.68 GAA (0.41) LMNATP53MAPK1RAB9AHTT
SCHEMBL29418129 0.68 TP53 (0.69) LMNATP53MAPK1RAB9AHTT
SCHEMBL159005 0.68 TP53 (0.69) LMNATP53MAPK1RAB9AHTT
SCHEMBL30110485 0.67 LMNA (0.44) LMNATP53MAPK1RAB9AHTT
SCHEMBL28856359 0.67 LMNA (0.44) LMNATP53MAPK1RAB9AHTT
SCHEMBL7519611 0.67 HTR2A (0.40) HTR2ALMNARAB9AKDM4EALDH1A1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-114133877-A Photocuring composition glue containing large conjugated aromatic ring acrylic compound monomer and use method and application thereof 西安思摩威新材料有限公司 2022-03-04 CN disclosed