SCHEMBL28734597

SCHEMBL28734597

c1cccsc(C(c2ccccc2)c2ccccc2)ccc1

nearest known ligand 0.53

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
MAPT P10636 3/20 0.53
TP53 P04637 1/20 0.45
AHR P35869 1/20 0.45
SLC6A3 Q01959 4/20 0.44
SLC6A2 P23975 3/20 0.44
SLC6A4 P31645 3/20 0.44
RBP1 P09455 1/20 0.39
TSHR P16473 1/20 0.39
OPRM1 P35372 1/20 0.38
OPRD1 P41143 1/20 0.38
OPRK1 P41145 1/20 0.38
OPRL1 P41146 1/20 0.38
CNR1 P21554 2/20 0.38
NQO1 P15559 1/20 0.36
CFTR P13569 1/20 0.35
GOPC Q9HD26 1/20 0.35
ALDH1A1 P00352 1/20 0.35
CYP2C9 P11712 1/20 0.35
CYP2C19 P33261 1/20 0.35
HSD17B10 Q99714 1/20 0.35

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL1537396 0.95 MAPT (0.57) MAPTTP53AHRSLC6A3SLC6A2
SCHEMBL31065464 0.91 MAPT (0.57) MAPTTP53AHRSLC6A3SLC6A2
SCHEMBL8538684 0.86 SLC6A2 (0.63) MAPTTP53AHRSLC6A3SLC6A2
SCHEMBL29064056 0.84 CNR1 (0.53) MAPTTP53AHRSLC6A3SLC6A2
Diethylamine SCHEMBL11328224 0.81 MAPT (0.47) MAPTTP53AHRSLC6A3SLC6A2
SCHEMBL2433699 0.80 ACP3 (0.46) MAPTTP53AHRSLC6A3SLC6A4
SCHEMBL28161124 0.77 MAPT (0.54) MAPTTP53AHRSLC6A3SLC6A2
SCHEMBL1305502 0.76 CES2 (0.45) MAPTTP53AHRTSHRNQO1
SCHEMBL31409242 0.76 AHR (0.45) MAPTTP53AHRTSHRCNR1
SCHEMBL945317 0.74 MAPT (0.44) MAPTTP53AHRSLC6A3TSHR

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-110963952-B Onium salt, resist composition and pattern forming method 信越化学工业株式会社 2022-10-21 CN disclosed
CN-114341215-A Curable composition 株式会社日本触媒 2022-04-12 CN disclosed