Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ALDH1A1 | P00352 | 3/20 | 0.50 |
| ▸ | TDP1 | Q9NUW8 | 2/20 | 0.50 |
| ▸ | TSHR | P16473 | 1/20 | 0.50 |
| ▸ | CA2 | P00918 | 1/20 | 0.46 |
| ▸ | GABRA1 | P14867 | 1/20 | 0.39 |
| ▸ | GABRB2 | P47870 | 1/20 | 0.39 |
| ▸ | KIF11 | P52732 | 1/20 | 0.38 |
| ▸ | SIGMAR1 | Q99720 | 3/20 | 0.34 |
| ▸ | NPSR1 | Q6W5P4 | 1/20 | 0.33 |
| ▸ | ALOX12 | P18054 | 2/20 | 0.32 |
| ▸ | GRIN2D | O15399 | 1/20 | 0.32 |
| ▸ | GRIN3B | O60391 | 1/20 | 0.32 |
| ▸ | GRIN1 | Q05586 | 1/20 | 0.32 |
| ▸ | GRIN2A | Q12879 | 1/20 | 0.32 |
| ▸ | GRIN2B | Q13224 | 1/20 | 0.32 |
| ▸ | GRIN2C | Q14957 | 1/20 | 0.32 |
| ▸ | GRIN3A | Q8TCU5 | 1/20 | 0.32 |
| ▸ | ATM | Q13315 | 1/20 | 0.32 |
| ▸ | CYP1A2 | P05177 | 2/20 | 0.32 |
| ▸ | ALOX15 | P16050 | 2/20 | 0.32 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL29720793 | 1.00 | ALDH1A1 (0.50) | ALDH1A1TDP1TSHRCA2GABRA1 | |
| Water SCHEMBL722703 | 0.97 | ALDH1A1 (0.48) | ALDH1A1TDP1TSHRCA2GABRA1 | |
| SCHEMBL27672332 | 0.91 | ALDH1A1 (0.43) | ALDH1A1TDP1TSHRCA2GABRA1 | |
| Acetic Acid SCHEMBL27880107 | 0.87 | ALDH1A1 (0.45) | ALDH1A1TDP1TSHRCA2GABRA1 | |
| SCHEMBL27611791 | 0.85 | ALDH1A1 (0.39) | ALDH1A1TDP1TSHRCA2GABRA1 | |
| SCHEMBL26291366 | 0.81 | ALDH1A1 (0.37) | ALDH1A1TDP1TSHRCA2SIGMAR1 | |
| SCHEMBL21798723 | 0.80 | ALDH1A1 (0.43) | ALDH1A1TDP1TSHRCA2GABRA1 | |
| Trifluoromethanesulfonic Acid SCHEMBL2483807 | 0.80 | TSHR (0.44) | ALDH1A1TDP1TSHRCA2GABRA1 | |
| Trifluoromethanesulfonic Acid SCHEMBL7535106 | 0.80 | TSHR (0.44) | ALDH1A1TDP1TSHRCA2GABRA1 | |
| SCHEMBL18242130 | 0.79 | ALDH1A1 (0.36) | ALDH1A1TDP1TSHRCA2SIGMAR1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 342 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-117659420-A | Zn-based organic coordination nano-particle, photoresist composition, and preparation method and application thereof | 清华大学 | 2024-03-08 | — | — | CN | claimed |
| CN-114414711-B | Identification method of onium salt photoacid generator in photoresist | 北京彤程创展科技有限公司 | 2023-10-13 | — | — | CN | claimed |
| CN-116836389-A | Low-temperature-curable positive photosensitive resin, resin composition, preparation method and application thereof | 明士(北京)新材料开发有限公司 | 2023-10-03 | — | — | CN | claimed |
| CN-112209866-B | Method for preparing 1-tertiary butyl-3, 3-dimethyl indoline compound | 同济大学 | 2023-06-16 | — | — | CN | claimed |
| CN-115027123-B | Antistatic CTP plate and preparation method thereof | 安徽强邦新材料股份有限公司 | 2023-06-13 | — | — | CN | claimed |
| CN-114414711-A | Method for identifying onium salt type photoacid generator in photoresist | 北京彤程创展科技有限公司 | 2022-04-29 | — | — | CN | claimed |
| CN-112209866-A | Method for preparing 1-tert-butyl-3, 3-dimethyl indoline compound | 同济大学 | 2021-01-12 | — | — | CN | claimed |
| CN-101288027-B | Low activation energy dissolution modification agents for photoresist applications | IBM | 2014-12-10 | — | — | CN | claimed |
| CN-101959686-B | Sensitizer/initiator composition for negative-working thermally sensitive compositions useful for lithographic printing plates | EASTMAN KODAK CO | 2013-03-20 | — | — | CN | claimed |
| CN-101454722-B | Negative-working radiation-sensitive compositions and imageable materials | EASTMAN KODAK CO | 2012-07-04 | — | — | CN | claimed |
| CN-101427181-B | Wet developable bottom antireflective coating composition and method of use | IBM | 2012-03-21 | — | — | CN | claimed |
| CN-101959686-A | Sensitizer/initiator composition for negative-working thermally sensitive compositions useful for lithographic printing plates | EASTMAN KODAK CO | 2011-01-26 | — | — | CN | claimed |
| CN-100561344-C | Have improve etch resistant properties fluoridize the photoresist material | IBM (US) | 2009-11-18 | — | — | CN | claimed |
| CN-101454722-A | Negative-working radiation-sensitive compositions and imageable materials | EASTMAN KODAK CO (US) | 2009-06-10 | — | — | CN | claimed |
| CN-101288027-A | Low activation energy dissolution modification agents for photoresist applications | IBM (US) | 2008-10-15 | — | — | CN | claimed |
| CN-1846169-A | Negative resist composition with fluorosulfonamide-containing polymer | IBM (US) | 2006-10-11 | — | — | CN | claimed |
| CN-1782876-A | Fluorinated photoresist materials with improved etch resistant properties | IBM (US) | 2006-06-07 | — | — | CN | claimed |
| CN-1637603-A | Positive photoresist composition with a polymer including a fluorosulfonamide group and process for its use | IBM (US) | 2005-07-13 | — | — | CN | claimed |
| CN-1615458-A | Negative deep ultraviolet photoresist | CLARIANT FINANCE BVI LTD (VG) | 2005-05-11 | — | — | CN | claimed |
| US-5498765-A | Positive photoresist composition containing photoacid generator and use thereof | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 1996-03-12 | — | — | US | claimed |