Predicted protein targets (top 2)
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Ethylene Glycol SCHEMBL231666 | 0.93 | TSHR (0.39) | ALDH1A1TSHR | |
| Ethylene Glycol SCHEMBL17199782 | 0.90 | TSHR (0.36) | ALDH1A1TSHR | |
| Ethylene Glycol SCHEMBL7195215 | 0.90 | TSHR (0.36) | ALDH1A1TSHR | |
| Di(Hydroxyethyl)Ether SCHEMBL9183213 | 0.83 | TSHR (0.53) | ALDH1A1TSHR | |
| Methoxymethane SCHEMBL8323899 | 0.82 | ALDH1A1 (0.50) | ALDH1A1TSHR | |
| 1,3-Propanediol SCHEMBL7190458 | 0.80 | ALDH1A1 (0.37) | ALDH1A1TSHR | |
| Ether SCHEMBL2878641 | 0.79 | ALDH1A1 (0.46) | ALDH1A1 | |
| Acetic Acid SCHEMBL2254617 | 0.79 | FFAR3 (0.39) | ALDH1A1TSHR | |
| Ethylene Glycol SCHEMBL3818428 | 0.79 | — | — | |
| Ethylene Glycol SCHEMBL78968 | 0.79 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 10 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-2479611-B1 | Chemically amplified positive resist composition and patterning process | SHINETSU CHEMICAL CO (JP) | 2014-10-15 | — | — | EP | disclosed |
| EP-2479611-A2 | Chemically amplified positive resist composition and patterning process | Shin-Etsu Chemical Co., Ltd. (JP) | 2012-07-25 | — | — | EP | disclosed |
| US-20120184100-A1 | CHEMICALLY AMPLIFIED POSITIVE RESIST COMPOSITION AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2012-07-19 | — | — | US | disclosed |
| EP-1324134-B1 | Resist composition and patterning process | SHINETSU CHEMICAL CO (JP) | 2010-10-20 | — | — | EP | disclosed |
| US-20050079443-A1 | Radiation-sensitive polymer composition and pattern forming method using the same | SHIN-ETSU CHEMICAL CO., LTD. | 2005-04-14 | — | — | US | disclosed |
| US-6866982-B2 | Resist composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2005-03-15 | — | — | US | disclosed |
| US-6635400-B2 | Alkali-insoluble polymer having acidic groups protected with acid labile groups, photoacid generator, and 1,2-naphthoquinonediazidosulfonyl group-bearing compound; high resolution; plating resistance | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2003-10-21 | — | — | US | disclosed |
| US-20030175617-A1 | Resist composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2003-09-18 | — | — | US | disclosed |
| EP-1324134-A2 | Resist composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2003-07-02 | — | — | EP | disclosed |
| US-20010044066-A1 | Resist composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2001-11-22 | — | — | US | disclosed |