Predicted protein targets (top 10)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.55 |
| ▸ | CYP4F2 | P78329 | 1/20 | 0.39 |
| ▸ | CYP4A11 | Q02928 | 1/20 | 0.39 |
| ▸ | TSHR | P16473 | 3/20 | 0.37 |
| ▸ | MAPK1 | P28482 | 2/20 | 0.36 |
| ▸ | MEN1 | O00255 | 2/20 | 0.35 |
| ▸ | KMT2A | Q03164 | 2/20 | 0.35 |
| ▸ | THRB | P10828 | 1/20 | 0.33 |
| ▸ | HTT | P42858 | 1/20 | 0.33 |
| ▸ | MAPT | P10636 | 1/20 | 0.33 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL35822 | 0.87 | — | — | |
| Di(Hydroxyethyl)Ether SCHEMBL8528937 | 0.85 | ALDH1A1 (0.50) | ALDH1A1CYP4F2CYP4A11TSHRMAPK1 | |
| Fluoride SCHEMBL1629162 | 0.84 | — | — | |
| Ethylene Glycol SCHEMBL27616494 | 0.84 | MAPK1 (0.38) | ALDH1A1CYP4F2CYP4A11TSHRMAPK1 | |
| SCHEMBL27974695 | 0.84 | — | — | |
| SCHEMBL28041169 | 0.84 | — | — | |
| Potassium SCHEMBL31590863 | 0.84 | — | — | |
| Di(Hydroxyethyl)Ether SCHEMBL8586098 | 0.82 | MEN1 (0.57) | ALDH1A1CYP4F2CYP4A11TSHRMAPK1 | |
| SCHEMBL28528977 | 0.81 | MAPK1 (0.36) | ALDH1A1CYP4F2CYP4A11TSHRMAPK1 | |
| Methoxymethane SCHEMBL2878577 | 0.81 | MAPK1 (0.36) | ALDH1A1CYP4F2CYP4A11TSHRMAPK1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 14 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-107074894-A | Metal complex and light-emitting element using same | 住友化学株式会社 | 2017-08-18 | — | — | CN | disclosed |
| EP-2479611-B1 | Chemically amplified positive resist composition and patterning process | SHINETSU CHEMICAL CO (JP) | 2014-10-15 | — | — | EP | disclosed |
| EP-2479611-A2 | Chemically amplified positive resist composition and patterning process | Shin-Etsu Chemical Co., Ltd. (JP) | 2012-07-25 | — | — | EP | disclosed |
| US-20120184100-A1 | CHEMICALLY AMPLIFIED POSITIVE RESIST COMPOSITION AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2012-07-19 | — | — | US | disclosed |
| EP-1324134-B1 | Resist composition and patterning process | SHINETSU CHEMICAL CO (JP) | 2010-10-20 | — | — | EP | disclosed |
| US-20050079443-A1 | Radiation-sensitive polymer composition and pattern forming method using the same | SHIN-ETSU CHEMICAL CO., LTD. | 2005-04-14 | — | — | US | disclosed |
| US-6866982-B2 | Resist composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2005-03-15 | — | — | US | disclosed |
| US-6635400-B2 | Alkali-insoluble polymer having acidic groups protected with acid labile groups, photoacid generator, and 1,2-naphthoquinonediazidosulfonyl group-bearing compound; high resolution; plating resistance | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2003-10-21 | — | — | US | disclosed |
| US-20030175617-A1 | Resist composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2003-09-18 | — | — | US | disclosed |
| EP-1324134-A2 | Resist composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2003-07-02 | — | — | EP | disclosed |
| US-20010044066-A1 | Resist composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2001-11-22 | — | — | US | disclosed |
| US-6030746-A | CHEMICALLY AMPLIFIED POSITIVE RESIST COMPRISES A ORGANIC SOLVENT, AN ALKALI SOLUBLE RESIN, A PHOTOACID GENERATOR AND A DISSOLUTION RATE REGULATOR | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2000-02-29 | — | — | US | disclosed |
| US-5972559-A | A PHOTORESIST MIXTURE COMPRISING AN ORGANIC SOLVENT, A COPOLYCARBONS BASE RESIN, A PHOTOACID GENERATOR, AND AN AROMATIC ALKYLENE CARBOXYLIC ACID COMPOUND; FOR IMPROVING THE FOOTING ON NITRIDE FILM SUBSTRATES AND POST EXPOSURE DELAY | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 1999-10-26 | — | — | US | disclosed |
| US-5876900-A | POLYHYDROXYSTYRENE POLYMER | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 1999-03-02 | — | — | US | disclosed |