⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL700371 | 0.86 | TTR (0.31) | — | |
| SCHEMBL5041961 | 0.86 | TTR (0.31) | — | |
| SCHEMBL700370 | 0.84 | DUSP5 (0.31) | — | |
| SCHEMBL13930816 | 0.79 | MEN1 (0.33) | — | |
| Ether SCHEMBL11152194 | 0.78 | — | — | |
| 3,5-Dihydroxybenzoic Acid SCHEMBL10605049 | 0.75 | CA12 (0.35) | — | |
| SCHEMBL28789752 | 0.75 | CYP2D6 (0.35) | — | |
| 2,4-Dihydroxybenzoic Acid SCHEMBL10601407 | 0.72 | CA12 (0.41) | — | |
| SCHEMBL5034538 | 0.72 | PTGS2 (0.30) | — | |
| SCHEMBL7101512 | 0.71 | TTR (0.31) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 64 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-11644750-B2 | Negative photoresist used for semiconductor encapsulation process | JIANGSU AISEN SEMICONDUCTOR MATERIAL CO., LTD. (CN) | 2023-05-09 | — | — | US | claimed |
| CN-115772362-A | Laser ablation composition for flexographic printing plate and preparation method thereof | 上海甚龙新材料技术有限公司 | 2023-03-10 | — | — | CN | claimed |
| EP-1405141-A4 | THERMALLY SENSITIVE COATING COMPOSITIONS CONTAINING MIXED DIAZO NOVOLAKS USEFUL FOR LITHOGRAPHIC ELEMENTS | CITIPLATE INC (US) | 2006-09-20 | — | — | EP | claimed |
| EP-1405141-A1 | THERMALLY SENSITIVE COATING COMPOSITIONS CONTAINING MIXED DIAZO NOVOLAKS USEFUL FOR LITHOGRAPHIC ELEMENTS | Citiplate, Inc. (US) | 2004-04-07 | — | — | EP | claimed |
| WO-2003001300-A1 | THERMALLY SENSITIVE COATING COMPOSITIONS CONTAINING MIXED DIAZO NOVOLAKS USEFUL FOR LITHOGRAPHIC ELEMENTS | CITIPLATE, INC. (US) | 2003-01-03 | — | — | WO | claimed |
| US-6436601-B1 | Thermally sensitive coating compositions containing mixed diazo novolaks useful for lithographic elements | CITIPLATE, INC. | 2002-08-20 | — | — | US | claimed |
| WO-1991019227-A1 | LIGHT SENSITIVE MATERIALS FOR LITHOGRAPHIC PLATES | HORSELL PLC (GB) | 1991-12-12 | — | — | WO | claimed |
| EP-0404507-A2 | Positive or negative working overlay color proofing system having photoresistive layer | HOECHST CELANESE CORPORATION (US) | 1990-12-27 | — | — | EP | claimed |
| US-4816380-A | Water soluble contrast enhancement layer method of forming resist image on semiconductor chip | TEXAS INSTRUMENTS INCORPORATED (US) | 1989-03-28 | — | — | US | claimed |
| US-4024122-A | Method of purifying 2,4-bis(6-diazo-5,6-dihydro-5-oxo-1-naphthalenesulfonyloxy benzophenone) | RCA CORPORATION (US) | 1977-05-17 | — | — | US | claimed |
| US-3950173-A | ELECTRON BEAM RECORDING ARTICLE WITH O-QUINONE DIAZIDE COMPOUND | RCA CORPORATION (US) | 1976-04-13 | — | — | US | claimed |
| US-11762290-B2 | Photoresist composition, method for preparing the same, and patterning method | Beijing Asahi Electronic Materials Co., Ltd (CN) | 2023-09-19 | — | — | US | disclosed |
| US-11644750-B2 | Negative photoresist used for semiconductor encapsulation process | JIANGSU AISEN SEMICONDUCTOR MATERIAL CO., LTD. (CN) | 2023-05-09 | — | — | US | disclosed |
| CN-115772362-A | Laser ablation composition for flexographic printing plate and preparation method thereof | 上海甚龙新材料技术有限公司 | 2023-03-10 | — | — | CN | disclosed |
| CN-114634429-B | Photosensitive diamine monomer and preparation method thereof, resin containing photosensitive diamine monomer and photosensitive resin composition | 波米科技有限公司 | 2022-11-22 | — | — | CN | disclosed |
| US-4260673-A | PRESENSITIZED, DIAZO OXIDE | MINNESOTA MINING AND MANUFACTURING COMPANY (US) | 1981-04-07 | — | — | US | disclosed |
| WO-1981000772-A1 | SINGLE SHEET COLOR PROOFING DIAZO OXIDE SYSTEM | MINNESOTA MINING & MFG (US) | 1981-03-19 | — | — | WO | disclosed |
| US-4024122-A | Method of purifying 2,4-bis(6-diazo-5,6-dihydro-5-oxo-1-naphthalenesulfonyloxy benzophenone) | RCA CORPORATION (US) | 1977-05-17 | — | — | US | disclosed |
| US-3961101-A | NAPHTHOQUINONE(1,2-)DIAZIDE SULFONIC ACID ESTER | RCA CORPORATION (US) | 1976-06-01 | — | — | US | disclosed |
| US-3950173-A | ELECTRON BEAM RECORDING ARTICLE WITH O-QUINONE DIAZIDE COMPOUND | RCA CORPORATION (US) | 1976-04-13 | — | — | US | disclosed |