SCHEMBL28792144

SCHEMBL28792144

O=C(O)c1c(Cl)c(CC2CO2)c(CC2CO2)c(Cl)c1C(=O)O

nearest known ligand 0.35

Predicted protein targets (top 3)

geneUniProtsupporting neighboursconfidence
HTT P42858 1/20 0.35
ALDH1A1 P00352 1/20 0.30
TDP1 Q9NUW8 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL3080712 0.94 HTT (0.33) HTTALDH1A1TDP1
SCHEMBL3063452 0.89 HTT (0.32) HTTALDH1A1TDP1
SCHEMBL29031707 0.84 TP53 (0.33) ALDH1A1
SCHEMBL795247 0.80 TP53 (0.31)
SCHEMBL27142378 0.80 TP53 (0.31)
SCHEMBL3071307 0.78 FEN1 (0.32)
SCHEMBL1646383 0.77 ALDH1A1 (0.31) ALDH1A1
SCHEMBL3068519 0.77 ALDH1A1 (0.31) ALDH1A1
SCHEMBL28356020 0.77
SCHEMBL1643688 0.77 ALDH1A1 (0.31) ALDH1A1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-114761876-A Composition for forming resist underlayer film 日产化学株式会社 2022-07-15 CN disclosed
CN-114746468-A Method for producing polymer 日产化学株式会社 2022-07-12 CN disclosed