Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | APP | P05067 | 6/20 | 0.42 |
| ▸ | KDM4E | B2RXH2 | 4/20 | 0.42 |
| ▸ | ALDH1A1 | P00352 | 4/20 | 0.42 |
| ▸ | MAPT | P10636 | 4/20 | 0.42 |
| ▸ | KMT2A | Q03164 | 4/20 | 0.42 |
| ▸ | MEN1 | O00255 | 3/20 | 0.42 |
| ▸ | LMNA | P02545 | 3/20 | 0.42 |
| ▸ | SMN1; SMN2 | Q16637 | 3/20 | 0.42 |
| ▸ | CYP1A2 | P05177 | 3/20 | 0.42 |
| ▸ | HSD17B10 | Q99714 | 3/20 | 0.42 |
| ▸ | RAB9A | P51151 | 3/20 | 0.42 |
| ▸ | CA12 | O43570 | 2/20 | 0.42 |
| ▸ | CA1 | P00915 | 2/20 | 0.42 |
| ▸ | CA2 | P00918 | 2/20 | 0.42 |
| ▸ | CA3 | P07451 | 2/20 | 0.42 |
| ▸ | CA4 | P22748 | 2/20 | 0.42 |
| ▸ | CA6 | P23280 | 2/20 | 0.42 |
| ▸ | CA5A | P35218 | 2/20 | 0.42 |
| ▸ | CA7 | P43166 | 2/20 | 0.42 |
| ▸ | CA9 | Q16790 | 2/20 | 0.42 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL8652709 | 1.00 | APP (0.42) | APPKDM4EALDH1A1MAPTKMT2A | |
| SCHEMBL2880789 | 0.84 | KDM4E (0.39) | KDM4EALDH1A1MAPTKMT2AMEN1 | |
| SCHEMBL309121 | 0.84 | KDM4E (0.54) | KDM4EALDH1A1MAPTKMT2AMEN1 | |
| SCHEMBL309120 | 0.84 | KDM4E (0.54) | KDM4EALDH1A1MAPTKMT2AMEN1 | |
| SCHEMBL8956496 | 0.83 | APP (0.40) | APPKDM4EALDH1A1MAPTKMT2A | |
| SCHEMBL14010594 | 0.82 | ALDH1A1 (0.38) | KDM4EALDH1A1MAPTSMN1; SMN2CYP1A2 | |
| SCHEMBL269262 | 0.82 | HRH4 (0.43) | KDM4EALDH1A1MAPTLMNASMN1; SMN2 | |
| SCHEMBL269261 | 0.82 | HRH4 (0.43) | KDM4EALDH1A1MAPTLMNASMN1; SMN2 | |
| SCHEMBL79976 | 0.81 | PDE5A (0.42) | KDM4EALDH1A1KMT2AMEN1LMNA | |
| SCHEMBL79977 | 0.81 | PDE5A (0.42) | KDM4EALDH1A1KMT2AMEN1LMNA |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 28 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-9926422-B2 | Bump-forming material, method for producing electronic component, method for producing semiconductor device, and semiconductor device | FUJITSU LIMITED (JP) | 2018-03-27 | — | — | US | disclosed |
| US-20170260348-A1 | BUMP-FORMING MATERIAL, METHOD FOR PRODUCING ELECTRONIC COMPONENT, METHOD FOR PRODUCING SEMICONDUCTOR DEVICE, AND SEMICONDUCTOR DEVICE | FUJITSU LIMITED (JP) | 2017-09-14 | — | — | US | disclosed |
| US-8647813-B2 | Photosensitive composition and photosensitive lithographic printing plate material | MITSUBISHI PAPER MILLS LIMITED (JP) | 2014-02-11 | — | — | US | disclosed |
| US-20130022927-A1 | PHOTOSENSITIVE COMPOSITION AND PHOTOSENSITIVE LITHOGRAPHIC PRINTING PLATE MATERIAL | MITSUBISHI PAPER MILLS LIMITED (JP) | 2013-01-24 | — | — | US | disclosed |
| US-20120000385-A1 | LITHOGRAPHIC PRINTING PLATE MATERIAL AND LITHOGRAPHIC PRINTING PLATE | KONICA MINOLTA MEDICAL & GRAPHIC, INC. (JP) | 2012-01-05 | — | — | US | disclosed |
| US-20110318689-A1 | LIGHT-SENSITIVE LITHOGRAPHIC PRINTING PLATE MATERIAL | MITSUBISHI PAPER MILLS LIMITED (JP) | 2011-12-29 | — | — | US | disclosed |
| US-20100112478-A1 | WATER-DEVELOPABLE PHOTOSENSITIVE LITHOGRAPHIC PRINTING PLATE MATERIAL | MITSUBISHI PAPER MILLS LIMITED (JP) | 2010-05-06 | — | — | US | disclosed |
| US-7704675-B2 | Photosensitive recording layer of sensityzing dye, polymerization initiator, polymerizable compound, binder polymer, protective oxygen barrier layer; backcoat layer of epoxy resin; infrared absorber; scratches prevented without interleaving slip sheets | FUJIFILM CORPORATION (JP) | 2010-04-27 | — | — | US | disclosed |
| US-20100081090-A1 | PROCESS FOR MAKING LITHOGRAPHIC PRINTING PLATE | FUJIFILM CORPORATION (JP) | 2010-04-01 | — | — | US | disclosed |
| EP-2090430-A2 | Photosensitive composition and lithographic printing original plate using the composition | Okamoto Chemical Industry Co., Ltd (JP) | 2009-08-19 | — | — | EP | disclosed |
| US-20070172758-A1 | Planographic printing plate material and its manufacturing process | KONICA MINOLTA MEDICAL & GRAPHIC, INC. (JP) | 2007-07-26 | — | — | US | disclosed |
| US-7244547-B2 | Photosensitive composition and image recording material using the same | FUJIFILM CORPORATION (JP) | 2007-07-17 | — | — | US | disclosed |
| EP-0441524-B1 | Photocrosslinkable photoinsolubilizable coating composition containing halomethyl-1,3,5-triazine moieties | MINNESOTA MINING & MFG (US) | 1998-10-07 | — | — | EP | disclosed |
| US-5496504-A | FREE RADICAL OR IONIC CHAIN POLYMERIZABLE; PHOTOINITIATORS; COPYING, IMAGING; RADIATION SENSITIVE | MINNESOTA MINING AND MANUFACTURING COMPANY (US) | 1996-03-05 | — | — | US | disclosed |
| EP-0359430-B1 | Halomethyl-1,3,5-triazines containing a monomeric moiety | MINNESOTA MINING & MFG (US) | 1995-05-10 | — | — | EP | disclosed |
| US-5387682-A | A photoinitiators, a polytriazines chemical intermediates; photosensitivity, photopolymerizable | MINNESOTA MINING AND MANUFACTURING COMPANY (US) | 1995-02-07 | — | — | US | disclosed |
| EP-0303945-B1 | Photosensitive composition based on 1,2-naphthoquinone diazides, and copying material prepared therefrom | HOECHST AG (DE) | 1993-11-24 | — | — | EP | disclosed |
| EP-0441524-A2 | Polymers containing halomethyl-1,3,5-triazine moieties | MINNESOTA MINING AND MANUFACTURING COMPANY (US) | 1991-08-14 | — | — | EP | disclosed |
| EP-0359430-A2 | Halomethyl-1,3,5-triazines containing a monomeric moiety | MINNESOTA MINING AND MANUFACTURING COMPANY (US) | 1990-03-21 | — | — | EP | disclosed |
| EP-0303945-A2 | Photosensitive composition based on 1,2-naphthoquinone diazides, and copying material prepared therefrom | HOECHST AKTIENGESELLSCHAFT (DE) | 1989-02-22 | — | — | EP | disclosed |