SCHEMBL309121

SCHEMBL309121

Clc1ccc(C=Cc2nc(C(Cl)(Cl)Cl)nc(C(Cl)(Cl)Cl)n2)cc1

nearest known ligand 0.54

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
KDM4E B2RXH2 3/20 0.54
ALDH1A1 P00352 2/20 0.54
MAPT P10636 2/20 0.54
CYP1A2 P05177 2/20 0.54
MAPK1 P28482 1/20 0.54
HSD17B10 Q99714 1/20 0.54
AHR P35869 1/20 0.44
NPC1 O15118 2/20 0.44
RAB9A P51151 2/20 0.44
HRH4 Q9H3N8 1/20 0.43
CASP3 P42574 1/20 0.39
SENP8 Q96LD8 1/20 0.39
SENP7 Q9BQF6 1/20 0.39
SENP6 Q9GZR1 1/20 0.39
DHFR P00374 1/20 0.39
MEN1 O00255 1/20 0.38
LMNA P02545 1/20 0.38
GLA P06280 1/20 0.38
GAA P10253 1/20 0.38
PKM P14618 1/20 0.38

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL309120 1.00 KDM4E (0.54) KDM4EALDH1A1MAPTCYP1A2MAPK1
SCHEMBL12595128 0.89 KDM4E (0.47) KDM4EALDH1A1MAPTCYP1A2MAPK1
SCHEMBL2880789 0.85 KDM4E (0.39) KDM4EALDH1A1MAPTCYP1A2MAPK1
SCHEMBL2879274 0.84 APP (0.42) KDM4EALDH1A1MAPTCYP1A2MAPK1
SCHEMBL269261 0.84 HRH4 (0.43) KDM4EALDH1A1MAPTCYP1A2MAPK1
SCHEMBL269262 0.84 HRH4 (0.43) KDM4EALDH1A1MAPTCYP1A2MAPK1
SCHEMBL14010594 0.84 ALDH1A1 (0.38) KDM4EALDH1A1MAPTCYP1A2MAPK1
SCHEMBL8652709 0.84 APP (0.42) KDM4EALDH1A1MAPTCYP1A2MAPK1
SCHEMBL79976 0.83 PDE5A (0.42) KDM4EALDH1A1NPC1RAB9AHRH4
SCHEMBL79977 0.83 PDE5A (0.42) KDM4EALDH1A1NPC1RAB9AHRH4

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 52 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-0620500-A2 Resist and pattern formation using the same HITACHI, LTD. (JP) 1994-10-19 EP claimed
EP-2154162-B1 REACTIVE URETHANE COMPOUND HAVING ETHER BOND, CURABLE COMPOSITION AND CURED MATERIAL SHOWA DENKO KK (JP) 2019-07-17 EP disclosed
EP-2356182-B1 RADIATION CURABLE COATING MATERIALS BASF SE (DE) 2015-05-06 EP disclosed
US-20130299736-A1 RADIATION-CURABLE COATING MATERIALS BASE SE (DE) 2013-11-14 US disclosed
US-8399569-B2 Reactive urethane compound having ether bond, curable composition, and cured material SHOWA DENKO K.K. (JP) 2013-03-19 US disclosed
EP-1866357-B1 (METH)ACRYLOYL GROUP-CONTAINING AROMATIC ISOCYANATE COMPOUND AND PRODUCTION PROCESS THEREOF SHOWA DENKO KK (JP) 2012-02-22 EP disclosed
US-8092982-B2 Photosensitive paste composition, barrier rib prepared using the composition and plasma display panel comprising the barrier rib SAMSUNG SDI CO., LTD. (KR) 2012-01-10 US disclosed
US-8044235-B2 (Meth) acryloyl group-containing aromatic isocyanate compound and production process thereof SHOWA DENKO K.K. (JP) 2011-10-25 US disclosed
US-20110230617-A1 RADIATION-CURABLE COATING MATERIALS BASF SE (DE) 2011-09-22 US disclosed
EP-2356182-A1 RADIATION CURABLE COATING MATERIALS BASF SE (DE) 2011-08-17 EP disclosed
EP-0915136-B1 Photocurable paint composition for road markings SHOWA DENKO KK (JP) 2004-01-21 EP disclosed
US-6486225-B1 Photocurable composition SHOWA DENKO KABUSHIKI KAISHA (JP) 2002-11-26 US disclosed
US-6211260-B1 MARKING ROADS WITH CURABLE PAINT, FILLERS, GLASS BEADS, CATIONIC DYES AND QUATERNARY ORGANIC BORATES SHOWA DENKO K.K. (JP) 2001-04-03 US disclosed
US-6190833-B1 (A) A PHENOL RESIN, (B) AN AMINO RESIN, (C) A COMPOUND HAVING TWO OR MORE CROSSLINKING GROUPS IN A MOLECULE, AND (D) A HALOMETHYL-1,3,5-TRIAZINE COMPOUND. JSR CORPORATION (JP) 2001-02-20 US disclosed
US-6110987-A CURED PRODUCTS HAVING AN EXCELLENT APPEARANCE WITHOUT COLORING CAUSED BY POLYMERIZATION INITIATOR SHOWA DENKO K.K. (JP) 2000-08-29 US disclosed
EP-1002817-A2 Photocurable composition SHOWA DENKO KABUSHIKI KAISHA (JP) 2000-05-24 EP disclosed
EP-0915136-A1 Photocurable paint composition for road markings SHOWA DENKO KABUSHIKI KAISHA (JP) 1999-05-12 EP disclosed
EP-0620500-A2 Resist and pattern formation using the same HITACHI, LTD. (JP) 1994-10-19 EP disclosed
EP-0165006-A2 Processes for preparing substituted halomethyl-s-triazines Polychrome Corporation (US) 1985-12-18 EP disclosed
US-4559401-A Process for preparing chromophore-substituted vinyl-halomethyl-s-triazines POLYCHROME CORPORATION (US) 1985-12-17 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20110230617-A1 RADIATION-CURABLE COATING MATERIALS RAD51, MGMT, RAD54L KDM4E 1273/4885ALDH1A1 2704/4885MAPT 34/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.