⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL15080716 | 0.91 | — | — | |
| SCHEMBL10219524 | 0.90 | — | — | |
| SCHEMBL18323688 | 0.88 | — | — | |
| SCHEMBL15080717 | 0.88 | — | — | |
| SCHEMBL20609290 | 0.86 | ABHD6 (0.33) | — | |
| SCHEMBL13558162 | 0.85 | — | — | |
| SCHEMBL2876134 | 0.84 | — | — | |
| SCHEMBL10191366 | 0.83 | — | — | |
| SCHEMBL10192982 | 0.82 | MGLL (0.30) | — | |
| SCHEMBL14977987 | 0.81 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 9 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20210200099-A1 | METHOD FOR PRODUCING SUBSTRATE WITH PATTERNED FILM | CENTRAL GLASS COMPANY, LIMITED (JP) | 2021-07-01 | — | — | US | disclosed |
| US-20170088683-A1 | SURFACE TREATMENT LIQUID | TOKYO OHKA KOGYO CO., LTD. (JP) | 2017-03-30 | — | — | US | disclosed |
| US-9223219-B2 | Pattern forming method, actinic ray-sensitive or radiation-sensitive resin composition and resist film | FUJIFILM CORPORATION (JP) | 2015-12-29 | — | — | US | disclosed |
| US-9051403-B2 | Photosensitive composition, pattern forming method using the photosensitive composition and compound for use in the photosensitive composition | FUJIFILM CORPORATION (JP) | 2015-06-09 | — | — | US | disclosed |
| US-8637220-B2 | Actinic ray-sensitive or radiation-sensitive resin composition, and resist film and pattern forming method using the composition | FUJIFILM CORPORATION (JP) | 2014-01-28 | — | — | US | disclosed |
| US-20120282548-A1 | PATTERN FORMING METHOD, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION AND RESIST FILM | FUJIFILM CORPORATION (JP) | 2012-11-08 | — | — | US | disclosed |
| EP-2420871-A1 | POLYMERIZABLE COMPOSITION FOR COLOR FILTER, COLOR FILTER, AND SOLID IMAGING ELEMENT | FUJIFILM Corporation (JP) | 2012-02-22 | — | — | EP | disclosed |
| US-20120003583-A1 | ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, AND RESIST FILM AND PATTERN FORMING METHOD USING THE COMPOSITION | FUJIFILM CORPORATION (JP) | 2012-01-05 | — | — | US | disclosed |
| US-20110318687-A1 | ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION AND PATTERN FORMING METHOD USING THE COMPOSITION | FUJIFILM CORPORATION (JP) | 2011-12-29 | — | — | US | disclosed |