SCHEMBL2881262

SCHEMBL2881262

COC(=O)C(F)(F)C12CC3CC(CC(CO)(C3)C1)C2

nearest known ligand 0.46

Predicted protein targets (top 5)

geneUniProtsupporting neighboursconfidence
GAA P10253 1/20 0.36
ALDH1A1 P00352 6/20 0.34
LMNA P02545 1/20 0.34
TSHR P16473 1/20 0.34
PKM P14618 1/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL3471342 0.74 SCN9A (0.35) GAAALDH1A1LMNA
SCHEMBL686250 0.71 ALDH1A1 (0.39) GAAALDH1A1LMNA
SCHEMBL685815 0.71 ALDH1A1 (0.39) GAAALDH1A1LMNA
SCHEMBL16285749 0.71 GAA (0.33) GAAALDH1A1LMNAPKM
SCHEMBL30091366 0.71 ALDH1A1 (0.48) GAAALDH1A1TSHRPKM
SCHEMBL1846645 0.71 ALDH1A1 (0.48) GAAALDH1A1TSHRPKM
SCHEMBL7453057 0.70 ALDH1A1 (0.37) GAAALDH1A1LMNATSHR
SCHEMBL7453561 0.70 ALDH1A1 (0.35) GAAALDH1A1LMNA
SCHEMBL12974926 0.69 ALDH1A1 (0.38) GAAALDH1A1LMNA
SCHEMBL685213 0.69 ALDH1A1 (0.38) GAAALDH1A1LMNA

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-2146247-B1 Resist patterning process and manufacturing photo mask SHINETSU CHEMICAL CO (JP) 2015-04-15 EP disclosed
EP-2146247-A1 Resist patterning process and manufacturing photo mask Shin-Etsu Chemical Co., Ltd. (JP) 2010-01-20 EP disclosed