Predicted protein targets (top 5)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | SCN9A | Q15858 | 5/20 | 0.35 |
| ▸ | GAA | P10253 | 1/20 | 0.31 |
| ▸ | ALDH1A1 | P00352 | 3/20 | 0.30 |
| ▸ | LMNA | P02545 | 1/20 | 0.30 |
| ▸ | HSD11B1 | P28845 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL2678411 | 0.84 | MDH1 (0.34) | SCN9AALDH1A1HSD11B1 | |
| SCHEMBL3822751 | 0.83 | GLA (0.35) | SCN9AALDH1A1 | |
| SCHEMBL13181372 | 0.77 | SCN9A (0.36) | SCN9AGAAALDH1A1LMNA | |
| SCHEMBL18195944 | 0.75 | ALDH1A1 (0.32) | SCN9AALDH1A1LMNA | |
| SCHEMBL2881262 | 0.74 | GAA (0.36) | GAAALDH1A1LMNA | |
| SCHEMBL5608223 | 0.72 | ALDH1A1 (0.39) | GAAALDH1A1LMNA | |
| SCHEMBL14858717 | 0.70 | ALDH1A1 (0.41) | SCN9AGAAALDH1A1LMNA | |
| SCHEMBL18232679 | 0.69 | SCN9A (0.36) | SCN9AGAAALDH1A1LMNA | |
| SCHEMBL11988723 | 0.69 | GAA (0.32) | SCN9AGAAALDH1A1LMNA | |
| SCHEMBL4461305 | 0.69 | SCN9A (0.32) | SCN9AALDH1A1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-8524440-B2 | Photoresist composition | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2013-09-03 | — | — | US | disclosed |
| US-8071270-B2 | Polyhydric compound and chemically amplified resist composition containing the same | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2011-12-06 | — | — | US | disclosed |
| US-20100075257-A1 | Resin and Chemically Amplified Resist Composition Comprising the Same | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2010-03-25 | — | — | US | disclosed |
| US-20090220886-A1 | POLYHYDRIC COMPOUND AND CHEMICALLY AMPLIFIED RESIST COMPOSITION CONTAINING THE SAME | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2009-09-03 | — | — | US | disclosed |
| US-7494763-B2 | Polyhydric phenol compound and chemically amplified resist composition containing the same | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2009-02-24 | — | — | US | disclosed |
| US-20080248417-A1 | Polyhydric phenol compound and chemically amplified resist composition containing the same | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2008-10-09 | — | — | US | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (2 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20080248417-A1 | Polyhydric phenol compound and chemically amplified resist composition containing the same | CCNA1, C1R, CCNA2 | SCN9A 4623/4885GAA 3546/4885ALDH1A1 2758/4885 |
| US-20090220886-A1 | POLYHYDRIC COMPOUND AND CHEMICALLY AMPLIFIED RESIST COMPOSITION CONTAINING THE SAME | C5, C1R, H1-4 | SCN9A 2956/4885GAA 4319/4885ALDH1A1 2633/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.