SCHEMBL2881391

SCHEMBL2881391

CC(Oc1ccc(N)cc1)Oc1ccc(N)cc1

nearest known ligand 0.52

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
TDP1 Q9NUW8 6/20 0.52
MAPK1 P28482 2/20 0.52
ALDH1A1 P00352 7/20 0.50
CYP3A4 P08684 2/20 0.50
TSHR P16473 2/20 0.50
TEAD4 Q15561 1/20 0.46
MAPT P10636 5/20 0.44
POLB P06746 1/20 0.44
SMN1; SMN2 Q16637 2/20 0.43
MAOA P21397 2/20 0.42
MEN1 O00255 2/20 0.42
KMT2A Q03164 2/20 0.42
APP P05067 2/20 0.41
NPC1 O15118 1/20 0.41
HPGD P15428 1/20 0.41
RAB9A P51151 1/20 0.41
NR4A1 P22736 1/20 0.41
MAOB P27338 1/20 0.41
MITF O75030 1/20 0.39
GAA P10253 1/20 0.39

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL8889526 0.90 TDP1 (0.54) TDP1MAPK1ALDH1A1CYP3A4TSHR
4,4'-Methylenedianiline SCHEMBL15663308 0.87 TDP1 (0.56) TDP1MAPK1ALDH1A1CYP3A4TSHR
SCHEMBL8762101 0.85 ALDH1A1 (0.50) TDP1MAPK1ALDH1A1CYP3A4TSHR
SCHEMBL11510047 0.84 TDP1 (0.48) TDP1MAPK1ALDH1A1CYP3A4TSHR
SCHEMBL38655995 0.84 TDP1 (0.52) TDP1MAPK1ALDH1A1CYP3A4TSHR
SCHEMBL5563 0.84 PARP10 (0.54) TDP1MAPK1ALDH1A1CYP3A4TSHR
SCHEMBL21693963 0.84 ALDH1A1 (0.52) TDP1MAPK1ALDH1A1CYP3A4TSHR
SCHEMBL8942092 0.83 TDP1 (0.41) TDP1MAPK1ALDH1A1CYP3A4TSHR
SCHEMBL21694071 0.82 CASP1 (0.50) TDP1MAPK1ALDH1A1CYP3A4TSHR
SCHEMBL21693972 0.82 TDP1 (0.41) TDP1MAPK1ALDH1A1CYP3A4TSHR

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 241 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-120082261-A Polymer carbon nanocomposite and application thereof in coating 中珀(北京)新材料科技有限公司 2025-06-03 CN claimed
US-4737398-A POLYAZOMETHYNE, POLYESTER OR POLYCARBONATE POLYPLASTICS CO., LTD. (JP) 1988-04-12 US claimed
US-4726998-A LIQUID CRYSTAL POLYMER SUBSTRATE, MAGNETIC LAYER POLYPLASTICS CO., LTD. (JP) 1988-02-23 US claimed
CN-120082261-A Polymer carbon nanocomposite and application thereof in coating 中珀(北京)新材料科技有限公司 2025-06-03 CN disclosed
US-20240191137-A1 THERMOPLASTIC COMPOSITIONS AND USES THEREOF SHPP GLOBAL TECHNOLOGIES B.V. (NL) 2024-06-13 US disclosed
WO-2024095878-A1 MODIFIER FOR THERMOPLASTIC RESIN, RESIN COMPOSITION, USE OF HYDROGENATED AROMATIC HYDROCARBON RESIN, TACKIFIER, AND PRESSURE-SENSITIVE ADHESIVE OR ADHESIVE COMPOSITION 荒川化学工業株式会社 2024-05-10 WO disclosed
WO-2024095883-A1 MODIFIER FOR THERMOPLASTIC RESIN, RESIN COMPOSITION, AND USE OF ROSIN RESIN 荒川化学工業株式会社 2024-05-10 WO disclosed
WO-2024095880-A1 MODIFYING AGENT FOR THERMOPLASTIC RESINS, RESIN COMPOSITION, AND USE OF HYDROGENATED AROMATIC HYDROCARBON RESIN 荒川化学工業株式会社 2024-05-10 WO disclosed
CN-111386494-B Liquid crystal aligning agent, liquid crystal alignment film, and liquid crystal display element 日产化学株式会社 2023-06-30 CN disclosed
CN-111448510-B Liquid crystal aligning agent, liquid crystal alignment film, liquid crystal element, and method for producing liquid crystal element JSR株式会社 2023-03-14 CN disclosed
CN-111433665-B Liquid crystal aligning agent, liquid crystal alignment film, liquid crystal element, and method for producing liquid crystal element JSR株式会社 2023-02-28 CN disclosed
US-4355132-A Anisotropic melt phase forming poly(ester-amide) derived from p-hydroxybenzoic acid, 2,6-naphthalenedicarboxylic acid, aromatic monomer capable of forming an amide linkage, and, optionally, hydroquinone and additional carbocyclic dicarboxylic acid CELANESE CORPORATION (US) 1982-10-19 US disclosed
US-4351918-A Poly(ester-amide) capable of forming an anisotropic melt phase derived from 6-hydroxy-2-naphthoic acid, other aromatic hydroxyacid, carbocyclic dicarboxylic acid, and aromatic monomer capable of forming an amide linkage CELANESE CORPORATION (US) 1982-09-28 US disclosed
US-4341688-A Poly(ester-amide) capable of forming an anisotropic melt phase derived from dihydroxyanthraquinone, hydroxybenzoic acid, dicarboxylic acid, and aromatic monomer capable of forming an amide linkage CELANESE CORPORATION (US) 1982-07-27 US disclosed
US-4339375-A Poly(ester-amide) capable of forming an anisotropic melt phase derived from p-hydroxybenzoic acid, 2,6-dihydroxynaphthalene, carbocyclic dicarboxylic acid, aromatic monomer capable of forming an amide linkage, and, optionally, additional aromatic diol CELANESE CORPORATION (US) 1982-07-13 US disclosed
EP-0053940-A1 Poly(ester-amide) capable of forming an anisotropic melt phase derived from 6-hydroxy-2-naphthoic acid, dicarboxylic acid and aromatic monomer capable of forming an amide linkage CELANESE CORPORATION (US) 1982-06-16 EP disclosed
US-4330457-A Poly(ester-amide) capable of forming an anisotropic melt phase derived from 6-hydroxy-2-naphthoic acid, dicarboxylic acid, and aromatic monomer capable of forming an amide linkage CELANESE CORPORATION (US) 1982-05-18 US disclosed
EP-0000563-B1 PROCESS FOR PREPARING AROMATIC URETHANES MITSUI TOATSU CHEMICALS, Inc. (JP) 1982-05-12 EP disclosed
US-4178455-A FROM AROMATIC NITRO COMPOUND, ALCOHOL AND CARBON MONOXIDE MITSUI TOATSU CHEMICALS, INCORPORATED (JP) 1979-12-11 US disclosed
EP-0000563-A1 Process for preparing aromatic urethanes MITSUI TOATSU CHEMICALS, Inc. (JP) 1979-02-07 EP disclosed