SCHEMBL28818580

SCHEMBL28818580

CC(C)(C)Oc1ccccc1[S+]([O-])c1ccc(C(=O)c2ccccc2)cc1

nearest known ligand 0.41

Predicted protein targets (top 17)

geneUniProtsupporting neighboursconfidence
ELANE P08246 7/20 0.41
ATM Q13315 1/20 0.38
ALDH1A1 P00352 2/20 0.38
SRD5A2 P31213 2/20 0.38
MAPT P10636 2/20 0.37
LMNA P02545 1/20 0.37
L3MBTL1 Q9Y468 1/20 0.37
PPARG P37231 2/20 0.37
PPARA Q07869 2/20 0.37
HPGD P15428 2/20 0.37
FABP2 P12104 1/20 0.37
SLC22A12 Q96S37 1/20 0.37
CYP1A2 P05177 1/20 0.37
CYP2D6 P10635 1/20 0.37
CYP2C19 P33261 1/20 0.37
RAB9A P51151 2/20 0.36
NPC1 O15118 1/20 0.36

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL20328481 0.84 KCNH2 (0.31)
SCHEMBL28818635 0.81 ELANE (0.39) ELANEATMALDH1A1SRD5A2MAPT
SCHEMBL28948620 0.80 ALDH1A1 (0.42) ELANEATMALDH1A1SRD5A2LMNA
SCHEMBL8323570 0.77 KCNH2 (0.34) CYP1A2CYP2D6CYP2C19
SCHEMBL1576927 0.75 ALDH1A1 (0.61) ELANEATMALDH1A1SRD5A2MAPT
SCHEMBL8771948 0.74 ALDH1A1 (0.58) ELANEATMALDH1A1SRD5A2MAPT
SCHEMBL28818631 0.72 LMNA (0.49) ELANEATMALDH1A1SRD5A2MAPT
SCHEMBL27432711 0.71 ALDH1A1 (0.57) ELANEATMALDH1A1SRD5A2LMNA
SCHEMBL28741706 0.71 ELANE (0.66) ELANEALDH1A1MAPTLMNAHPGD
SCHEMBL7935392 0.71 LMNA (0.51) ATMALDH1A1SRD5A2MAPTLMNA

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-114901638-B Sulfonium salt, photoacid generator, curable composition, and resist composition 三亚普罗股份有限公司 2024-10-29 CN disclosed
CN-114901638-A Sulfonium salt, photoacid generator, curable composition, and resist composition 三亚普罗股份有限公司 2022-08-12 CN disclosed