Ethylene

Ethylene

SCHEMBL28818893

C=C.CCCCCCCCCC=CCOc1ccccc1

nearest known ligand 0.50

Full drug profile on Sugi Atlas →

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
AOC3 Q16853 1/20 0.50
PPARA Q07869 3/20 0.48
LTA4H P09960 2/20 0.47
CYSLTR2 Q9NS75 2/20 0.47
CYSLTR1 Q9Y271 2/20 0.47
CNR1 P21554 2/20 0.45
MLNR O43193 1/20 0.45
NR1I2 O75469 1/20 0.45
ESR1 P03372 1/20 0.45
NR3C1 P04150 1/20 0.45
PGR P06401 1/20 0.45
ADRB2 P07550 1/20 0.45
CHRM2 P08172 1/20 0.45
ADRB1 P08588 1/20 0.45
HTR1A P08908 1/20 0.45
ADRA2A P08913 1/20 0.45
ADORA3 P0DMS8 1/20 0.45
CHRM1 P11229 1/20 0.45
DRD2 P14416 1/20 0.45
ADRA2B P18089 1/20 0.45

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL28154134 0.97 AOC3 (0.53) AOC3PPARALTA4HCYSLTR2CYSLTR1
SCHEMBL28918162 0.97 AOC3 (0.53) AOC3PPARALTA4HCYSLTR2CYSLTR1
Sulfuric Acid SCHEMBL27996445 0.92 PPARA (0.48) AOC3PPARALTA4HCYSLTR2CYSLTR1
Sulfuric Acid SCHEMBL27969762 0.90 PPARA (0.47) AOC3PPARALTA4HCYSLTR2CYSLTR1
Ethylene SCHEMBL6537992 0.89 LTA4H (0.62) PPARALTA4HCNR1MLNRNR1I2
Ethylene SCHEMBL6537996 0.89 LTA4H (0.62) PPARALTA4HCNR1MLNRNR1I2
Sulfuric Acid SCHEMBL27623293 0.88 PPARA (0.50) AOC3PPARALTA4HCYSLTR2CYSLTR1
Sulfuric Acid SCHEMBL28110877 0.87 PPARA (0.49) AOC3PPARALTA4HCYSLTR2CYSLTR1
SCHEMBL15859351 0.85 LTA4H (0.66) PPARALTA4HCNR1MLNRNR1I2
SCHEMBL15859352 0.85 LTA4H (0.66) PPARALTA4HCNR1MLNRNR1I2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-104582899-B Polishing agent, polishing agent kit, and method for polishing substrate 日立化成株式会社 2018-11-09 CN disclosed
CN-107850845-A Photosensitive resin composition for flexographic printing and flexographic printing original plate 旭化成株式会社 2018-03-27 CN disclosed
CN-107267080-A Surface protection sheet 日东电工株式会社 2017-10-20 CN disclosed
CN-106471090-A CMP lapping liquid and Ginding process 日立化成株式会社 2017-03-01 CN disclosed
CN-104755566-A Ink for inkjet recording, ink cartridge, and inkjet recording method CANON KK 2015-07-01 CN disclosed
CN-104582899-A Polishing agent, polishing agent kit, and method for polishing substrate HITACHI CHEMICAL CO LTD 2015-04-29 CN disclosed