Predicted protein targets (top 9)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | HPGD | P15428 | 1/20 | 0.32 |
| ▸ | POLB | P06746 | 1/20 | 0.31 |
| ▸ | MAPT | P10636 | 1/20 | 0.31 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.31 |
| ▸ | CHRNB2 | P17787 | 1/20 | 0.30 |
| ▸ | CHRNB4 | P30926 | 1/20 | 0.30 |
| ▸ | CHRNA3 | P32297 | 1/20 | 0.30 |
| ▸ | CHRNA7 | P36544 | 1/20 | 0.30 |
| ▸ | CHRNA4 | P43681 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL6697794 | 0.84 | POLB (0.34) | HPGDPOLBMAPTALDH1A1CHRNB2 | |
| SCHEMBL6694601 | 0.82 | ALDH1A1 (0.34) | HPGDPOLBMAPTALDH1A1CHRNB2 | |
| SCHEMBL6692559 | 0.82 | HPGD (0.32) | HPGDPOLBMAPTALDH1A1CHRNB2 | |
| SCHEMBL6695291 | 0.80 | ALDH1A1 (0.32) | HPGDALDH1A1CHRNB2CHRNB4CHRNA3 | |
| SCHEMBL6689020 | 0.80 | HPGD (0.31) | HPGDPOLBMAPT | |
| SCHEMBL6699720 | 0.80 | CHRNB2 (0.35) | HPGDPOLBMAPTCHRNB2CHRNB4 | |
| SCHEMBL6698245 | 0.78 | CHRNB2 (0.35) | POLBMAPTALDH1A1CHRNB2CHRNB4 | |
| SCHEMBL6691342 | 0.78 | ALDH1A1 (0.31) | ALDH1A1CHRNB2CHRNB4CHRNA3CHRNA7 | |
| SCHEMBL6694514 | 0.77 | CHRNB2 (0.33) | POLBMAPTCHRNB2CHRNB4CHRNA3 | |
| SCHEMBL6690480 | 0.76 | CHRNB2 (0.34) | CHRNB2CHRNB4CHRNA3CHRNA7CHRNA4 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-2482132-B1 | Resist pattern forming process | SHINETSU CHEMICAL CO (JP) | 2019-10-16 | — | — | EP | disclosed |
| EP-2146247-B1 | Resist patterning process and manufacturing photo mask | SHINETSU CHEMICAL CO (JP) | 2015-04-15 | — | — | EP | disclosed |
| US-20120196211-A1 | RESIST PATTERN FORMING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2012-08-02 | — | — | US | disclosed |
| EP-2482132-A1 | Resist pattern forming process | Shin-Etsu Chemical Co., Ltd. (JP) | 2012-08-01 | — | — | EP | disclosed |
| EP-2146247-A1 | Resist patterning process and manufacturing photo mask | Shin-Etsu Chemical Co., Ltd. (JP) | 2010-01-20 | — | — | EP | disclosed |