SCHEMBL28836255

SCHEMBL28836255

O=C(O)C1CCCN1C(=O)OCC(Cl)(Cl)Cl

nearest known ligand 0.61

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
▸ RAB9A P51151 1/20 0.61
▸ ALDH1A1 P00352 1/20 0.50
▸ SMN1; SMN2 Q16637 1/20 0.50
▸ LMNA P02545 2/20 0.48
▸ HSD17B10 Q99714 2/20 0.48
▸ CYP2C19 P33261 1/20 0.48
▸ ACE P12821 10/20 0.46
▸ REN P00797 3/20 0.44
▸ KDM4E B2RXH2 1/20 0.44
▸ F2 P00734 1/20 0.44
▸ LTA4H P09960 1/20 0.44
▸ MAPT P10636 1/20 0.44
▸ PEPD P12955 1/20 0.44
▸ ALOX15 P16050 1/20 0.44
▸ PTGS1 P23219 1/20 0.44
▸ HTR2A P28223 1/20 0.44
▸ PTGS2 P35354 1/20 0.44
▸ HRH1 P35367 1/20 0.44
▸ THPO P40225 1/20 0.44
▸ PMP22 Q01453 1/20 0.44

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL7367598 1.00 RAB9A (0.61) RAB9AALDH1A1SMN1; SMN2LMNAHSD17B10
SCHEMBL7873494 0.90 RAB9A (0.49) RAB9AALDH1A1SMN1; SMN2LMNAHSD17B10
SCHEMBL5701849 0.90 RAB9A (0.49) RAB9AALDH1A1SMN1; SMN2LMNAHSD17B10
SCHEMBL5702061 0.90 RAB9A (0.49) RAB9AALDH1A1SMN1; SMN2LMNAHSD17B10
SCHEMBL10595318 0.87 RAB9A (0.47) RAB9AALDH1A1SMN1; SMN2LMNAHSD17B10
SCHEMBL10595315 0.87 RAB9A (0.47) RAB9AALDH1A1SMN1; SMN2LMNAHSD17B10
SCHEMBL27904262 0.86 RAB9A (0.60) RAB9AALDH1A1SMN1; SMN2LMNAHSD17B10
SCHEMBL23217920 0.83 RAB9A (0.65) RAB9AALDH1A1SMN1; SMN2LMNAHSD17B10
SCHEMBL3172593 0.81 RAB9A (0.71) RAB9AALDH1A1SMN1; SMN2LMNAHSD17B10
SCHEMBL7406144 0.81 RAB9A (0.71) RAB9AALDH1A1SMN1; SMN2LMNAHSD17B10

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-115053184-A Composition for forming EUV resist underlayer film 日产化学株式会社 2022-09-13 — — CN disclosed
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