SCHEMBL28838519

SCHEMBL28838519

Cc1ccsc1C(C(=O)c1ccccc1)N1CCOCC1

nearest known ligand 0.51

Predicted protein targets (top 18)

geneUniProtsupporting neighboursconfidence
LMNA P02545 4/20 0.51
L3MBTL1 Q9Y468 2/20 0.51
ALDH1A1 P00352 9/20 0.50
TSHR P16473 5/20 0.50
CYP3A4 P08684 1/20 0.50
CYP2C19 P33261 1/20 0.50
SMN1; SMN2 Q16637 4/20 0.49
MAPT P10636 3/20 0.49
POLB P06746 1/20 0.48
KMT2A Q03164 1/20 0.48
HPGD P15428 1/20 0.47
HTT P42858 1/20 0.45
RAB9A P51151 1/20 0.45
ATM Q13315 1/20 0.45
HIF1A Q16665 1/20 0.45
GAA P10253 1/20 0.45
HSD17B10 Q99714 1/20 0.43
KDM4E B2RXH2 1/20 0.41

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL2468109 0.77 LMNA (0.73) LMNAL3MBTL1ALDH1A1TSHRCYP3A4
SCHEMBL321368 0.72 ALDH1A1 (0.67) LMNAL3MBTL1ALDH1A1TSHRCYP3A4
SCHEMBL27591386 0.71 TSHR (0.47) LMNAL3MBTL1ALDH1A1TSHRCYP3A4
Hydrochloric Acid SCHEMBL10943241 0.71 ALDH1A1 (0.65) LMNAL3MBTL1ALDH1A1TSHRCYP3A4
SCHEMBL501353 0.69 HSD17B10 (0.61) LMNAL3MBTL1ALDH1A1TSHRCYP3A4
SCHEMBL6202116 0.69 LMNA (0.69) LMNAL3MBTL1ALDH1A1TSHRCYP3A4
Hydrochloric Acid SCHEMBL27718466 0.68 MAPT (0.62) LMNAL3MBTL1ALDH1A1TSHRCYP3A4
SCHEMBL27536932 0.68 ALDH1A1 (0.64) LMNAL3MBTL1ALDH1A1TSHRCYP3A4
SCHEMBL2552753 0.67 ALDH1A1 (0.49) LMNAL3MBTL1ALDH1A1TSHRCYP3A4
SCHEMBL627906 0.67 ALDH1A1 (0.73) LMNAL3MBTL1ALDH1A1TSHRCYP3A4

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-115398337-A Photosensitive element and method for forming resist pattern 旭化成株式会社 2022-11-25 CN disclosed
CN-110167980-B Composition for forming cured film, alignment material, and phase difference material 日产化学株式会社 2022-09-20 CN disclosed