SCHEMBL28852923

SCHEMBL28852923

O=C(OC(=O)c1ccc(Br)c(Br)c1)c1ccccc1

nearest known ligand 0.47

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
▸ LMNA P02545 2/20 0.47
▸ F2 P00734 1/20 0.47
▸ HPGD P15428 3/20 0.46
▸ CYP1A2 P05177 1/20 0.46
▸ CYP2D6 P10635 1/20 0.46
▸ CYP2C19 P33261 1/20 0.46
▸ TSHR P16473 2/20 0.44
▸ NPC1 O15118 2/20 0.44
▸ RAB9A P51151 2/20 0.44
▸ MAPT P10636 4/20 0.42
▸ SMN1; SMN2 Q16637 3/20 0.42
▸ HDAC1 Q13547 1/20 0.41
▸ HDAC8 Q9BY41 1/20 0.41
▸ HDAC6 Q9UBN7 1/20 0.41
▸ GAA P10253 1/20 0.41
▸ NFKB1 P19838 1/20 0.41
▸ NFKB2 Q00653 1/20 0.41
▸ RELA Q04206 1/20 0.41
▸ TDP1 Q9NUW8 3/20 0.40
▸ TP53 P04637 1/20 0.40

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL28852920 0.90 NOTUM (0.44) HPGDCYP1A2CYP2D6CYP2C19MAPT
SCHEMBL29990553 0.90 NOTUM (0.44) HPGDCYP1A2CYP2D6CYP2C19MAPT
SCHEMBL8717537 0.82 LMNA (0.67) LMNAF2TSHRMAPTSMN1; SMN2
SCHEMBL246938 0.80 NPC1 (0.62) LMNAF2HPGDCYP1A2CYP2C19
SCHEMBL545343 0.80 LMNA (0.58) LMNAF2TSHRRAB9AMAPT
Benzene SCHEMBL27793442 0.79 LMNA (0.70) LMNAF2CYP2C19TSHRMAPT
Hydrogen Peroxide SCHEMBL27952375 0.79 LMNA (0.70) LMNAF2CYP2C19TSHRMAPT
SCHEMBL52413 0.79 LMNA (0.70) LMNAF2CYP2C19TSHRMAPT
SCHEMBL5488350 0.79 SMN1; SMN2 (0.61) LMNAF2HPGDCYP1A2TSHR
SCHEMBL8757764 0.79 KMT2A (0.56) LMNAF2HPGDTSHRNPC1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-115160569-B Photosensitive polyamic acid ester resin, resin composition and electronic component 明士(北京)新材料开发有限公司 2022-12-27 — — CN disclosed
CN-115236938-A Negative photosensitive polyamic acid ester resin composition and use thereof 明士(北京)新材料开发有限公司 2022-10-25 — — CN disclosed
CN-115160569-A Photosensitive polyamic acid ester resin, resin composition and electronic component 明士(北京)新材料开发有限公司 2022-10-11 — — CN disclosed
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