SCHEMBL29990553

SCHEMBL29990553

O=C(OC(=O)c1ccc(Br)c(Br)c1)c1ccc(Br)c(Br)c1

nearest known ligand 0.44

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
▸ NOTUM Q6P988 1/20 0.44
▸ ALDH1A1 P00352 2/20 0.42
▸ ESR1 P03372 2/20 0.41
▸ HPGD P15428 4/20 0.37
▸ CYP1A2 P05177 2/20 0.37
▸ CYP2D6 P10635 1/20 0.37
▸ CYP2C19 P33261 1/20 0.37
▸ TTR P02766 1/20 0.37
▸ CA1 P00915 4/20 0.36
▸ CA2 P00918 4/20 0.36
▸ CA12 O43570 3/20 0.36
▸ CA7 P43166 3/20 0.36
▸ CA9 Q16790 3/20 0.36
▸ CA14 Q9ULX7 3/20 0.36
▸ XDH P47989 1/20 0.36
▸ CES2 O00748 1/20 0.36
▸ CES1 P23141 1/20 0.36
▸ MAPT P10636 3/20 0.35
▸ HSD17B10 Q99714 2/20 0.35
▸ GAA P10253 2/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL28852920 1.00 NOTUM (0.44) NOTUMALDH1A1ESR1HPGDCYP1A2
SCHEMBL28852923 0.90 LMNA (0.47) NOTUMALDH1A1ESR1HPGDCYP1A2
SCHEMBL12151586 0.83 NOTUM (0.64) NOTUMALDH1A1HPGDCA1CA2
SCHEMBL22468902 0.78 CA12 (0.61) ALDH1A1ESR1HPGDCYP1A2CA1
SCHEMBL588825 0.76 TTR (0.56) ALDH1A1HPGDCYP1A2TTRCA1
SCHEMBL29810232 0.76 TTR (0.56) ALDH1A1HPGDCYP1A2TTRCA1
SCHEMBL7683262 0.74 MAPT (0.40) NOTUMALDH1A1HPGDCYP1A2CYP2D6
SCHEMBL3022643 0.74 ALDH1A1 (0.39) NOTUMALDH1A1HPGDCYP1A2CYP2D6
SCHEMBL3022646 0.74 MAPT (0.47) ALDH1A1HPGDMAPTHSD17B10
SCHEMBL27557037 0.74 PARP1 (0.54) ALDH1A1CYP2C19CA1CA2CA12

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-115160569-B Photosensitive polyamic acid ester resin, resin composition and electronic component 明士(北京)新材料开发有限公司 2022-12-27 — — CN disclosed
CN-115160569-A Photosensitive polyamic acid ester resin, resin composition and electronic component 明士(北京)新材料开发有限公司 2022-10-11 — — CN disclosed
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