SCHEMBL28855819

SCHEMBL28855819

CON=C(C)C(=NOS(=O)(=O)C(F)(F)F)S(=O)(=O)C(F)(F)F

nearest known ligand 0.30

Predicted protein targets (top 4)

geneUniProtsupporting neighboursconfidence
F2 P00734 1/20 0.30
PRSS1 P07477 1/20 0.30
PRSS2 P07478 1/20 0.30
PRSS3 P35030 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL6440094 0.77 F2 (0.33) F2PRSS1PRSS2PRSS3
SCHEMBL14707489 0.70 F2 (0.31) F2PRSS1PRSS2PRSS3
SCHEMBL28484190 0.69 F2 (0.36) F2PRSS1PRSS2PRSS3
SCHEMBL15744280 0.66
SCHEMBL14712451 0.65 F2 (0.30) F2PRSS1PRSS2PRSS3
SCHEMBL9179912 0.64 USP2 (0.31)
SCHEMBL14107990 0.64 MAPT (0.32)
Trifluoromethanesulfonic Acid SCHEMBL28776121 0.64 ALDH1A1 (0.40) F2PRSS1PRSS2PRSS3
SCHEMBL1332156 0.62
SCHEMBL16998538 0.62

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-115023653-A Photosensitive resin composition, photosensitive resin coating film, photosensitive dry film, and pattern formation method 信越化学工业株式会社 2022-09-06 CN disclosed