SCHEMBL28856136

SCHEMBL28856136

N=C1Cc2cccc3cccc(c23)C1

nearest known ligand 0.61

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
TSHR P16473 5/20 0.61
CYP3A4 P08684 3/20 0.61
ALDH1A1 P00352 10/20 0.48
HPGD P15428 7/20 0.48
KDM4E B2RXH2 5/20 0.48
HSD17B10 Q99714 7/20 0.41
CYP1A2 P05177 3/20 0.41
CYP1A1 P04798 1/20 0.41
CYP1B1 Q16678 1/20 0.41
TYMS P04818 2/20 0.36
CYP2C19 P33261 1/20 0.36
LMNA P02545 1/20 0.35
PARP1 P09874 1/20 0.35
L3MBTL1 Q9Y468 3/20 0.35
MAPK1 P28482 2/20 0.35
ATM Q13315 1/20 0.35
TDP1 Q9NUW8 1/20 0.33
THRB P10828 1/20 0.33
GAA P10253 3/20 0.32
MAPT P10636 3/20 0.32

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL9956579 0.84 TSHR (0.83) TSHRCYP3A4ALDH1A1HPGDKDM4E
SCHEMBL598499 0.76 TSHR (1.00) TSHRCYP3A4ALDH1A1HPGDKDM4E
SCHEMBL30352929 0.76 TSHR (1.00) TSHRCYP3A4ALDH1A1HPGDKDM4E
SCHEMBL12464158 0.75 CYP1A2 (0.50) TSHRCYP3A4KDM4EHSD17B10CYP1A2
SCHEMBL28826361 0.75 TSHR (0.61) TSHRCYP3A4ALDH1A1HPGDKDM4E
SCHEMBL29190457 0.75 TSHR (0.61) TSHRCYP3A4ALDH1A1HPGDKDM4E
SCHEMBL5054879 0.75 CYP3A4 (0.61) TSHRCYP3A4ALDH1A1HPGDKDM4E
SCHEMBL6255591 0.75 ALDH1A1 (0.59) TSHRCYP3A4ALDH1A1HPGDKDM4E
SCHEMBL30080993 0.75 ALDH1A1 (0.59) TSHRCYP3A4ALDH1A1HPGDKDM4E
SCHEMBL4846405 0.74 TSHR (0.94) TSHRCYP3A4ALDH1A1HPGDKDM4E

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-115141304-A High-refraction film-forming resin containing triphenylmethanol ester structure and photoresist composition 江苏集萃光敏电子材料研究所有限公司 2022-10-04 CN claimed
CN-115141304-A High-refraction film-forming resin containing triphenylmethanol ester structure and photoresist composition 江苏集萃光敏电子材料研究所有限公司 2022-10-04 CN disclosed
CN-115141304-A High-refraction film-forming resin containing triphenylmethanol ester structure and photoresist composition 江苏集萃光敏电子材料研究所有限公司 2022-10-04 CN disclosed