SCHEMBL9956579

SCHEMBL9956579

c1cc2c3c(cccc3c1)C2

nearest known ligand 0.83

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
TSHR P16473 5/20 0.83
CYP3A4 P08684 3/20 0.83
ALDH1A1 P00352 10/20 0.56
HPGD P15428 6/20 0.56
KDM4E B2RXH2 5/20 0.56
HSD17B10 Q99714 7/20 0.50
CYP1A2 P05177 4/20 0.50
CYP1A1 P04798 1/20 0.50
CYP1B1 Q16678 1/20 0.50
TYMS P04818 1/20 0.41
CYP2C19 P33261 1/20 0.41
L3MBTL1 Q9Y468 3/20 0.41
MAPK1 P28482 2/20 0.41
ATM Q13315 1/20 0.41
LMNA P02545 1/20 0.40
PARP1 P09874 1/20 0.40
THRB P10828 2/20 0.39
MAOA P21397 2/20 0.38
MAOB P27338 1/20 0.38
CES2 O00748 1/20 0.38

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL30352929 0.91 TSHR (1.00) TSHRCYP3A4ALDH1A1HPGDKDM4E
SCHEMBL598499 0.91 TSHR (1.00) TSHRCYP3A4ALDH1A1HPGDKDM4E
SCHEMBL4846405 0.88 TSHR (0.94) TSHRCYP3A4ALDH1A1HPGDKDM4E
SCHEMBL30001721 0.88 TSHR (0.94) TSHRCYP3A4ALDH1A1HPGDKDM4E
SCHEMBL29190457 0.84 TSHR (0.61) TSHRCYP3A4ALDH1A1HPGDKDM4E
SCHEMBL28826361 0.84 TSHR (0.61) TSHRCYP3A4ALDH1A1HPGDKDM4E
SCHEMBL28856136 0.84 TSHR (0.61) TSHRCYP3A4ALDH1A1HPGDKDM4E
SCHEMBL5054879 0.84 CYP3A4 (0.61) TSHRCYP3A4ALDH1A1HPGDKDM4E
Acenaphthene SCHEMBL3416108 0.81 TSHR (0.57) TSHRCYP3A4ALDH1A1HPGDKDM4E
Acenaphthene SCHEMBL1162573 0.81 TSHR (0.57) TSHRCYP3A4ALDH1A1HPGDKDM4E

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 11 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-122055347-A Oligomeric binaphthyl compounds and thermoplastic resins 三菱瓦斯化学株式会社 2026-05-15 CN disclosed
EP-3676239-B1 BINAPHTHYL COMPOUNDS REUTER CHEMISCHE APPBAU E K (DE) 2026-04-15 EP disclosed
US-20260070867-A1 BINAPHTHYL COMPOUNDS AND THERMOPLASTIC RESINS MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2026-03-12 US disclosed
US-12570593-B2 Triarylmethane compounds MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2026-03-10 US disclosed
EP-4514880-A1 OLIGOMERIC BINAPHTYL COMPOUNDS AND THERMOPLASTIC RESINS Mitsubishi Gas Chemical Company, Inc. (JP) 2025-03-05 EP disclosed
US-20230391704-A1 TRIARYLMETHANE COMPOUNDS MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2023-12-07 US disclosed
WO-2023210833-A1 OLIGOMERIC BINAPHTYL COMPOUNDS AND THERMOPLASTIC RESINS MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2023-11-02 WO disclosed
CN-104067174-A Pattern forming method, actinic ray-sensitive or radiation-sensitive resin composition, resist film, method for producing electronic device, and electronic device FUJIFILM CORP 2014-09-24 CN disclosed
WO-2014104400-A1 ACTINIC-RAY- OR RADIATION-SENSITIVE RESIN COMPOSITION, ACTINIC-RAY- OR RADIATION-SENSITIVE FILM AND METHOD OF FORMING PATTERN FUJIFILM CORPORATION (JP) 2014-07-03 WO disclosed
WO-2013047911-A1 ACTINIC-RAY- OR RADIATION-SENSITIVE RESIN COMPOSITION, ACTINIC-RAY- OR RADIATION-SENSITIVE FILM THEREFROM, METHOD OF FORMING PATTERN USING THE COMPOSITION, PROCESS FOR MANUFACTURING ELECTRONIC DEVICE AND ELECTRONIC DEVICE FUJIFILM CORPORATION (JP) 2013-04-04 WO disclosed
WO-2012086849-A1 ACTINIC-RAY- OR RADIATION-SENSITIVE RESIN COMPOSITION, ACTINIC-RAY- OR RADIATION-SENSITIVE FILM THEREFROM AND METHOD OF FORMING PATTERN USING THE COMPOSITION FUJIFILM CORPORATION (JP) 2012-06-28 WO disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (3 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-12570593-B2 Triarylmethane compounds CBR1, CBR3, NCOR2 TSHR 1033/4885CYP3A4 464/4885ALDH1A1 1911/4885
US-20230391704-A1 TRIARYLMETHANE COMPOUNDS CBR3, HAX1, HRH3 TSHR 1467/4885CYP3A4 113/4885ALDH1A1 2431/4885
US-20260070867-A1 BINAPHTHYL COMPOUNDS AND THERMOPLASTIC RESINS CBR1, CBR3, SCO2 TSHR 3434/4885CYP3A4 744/4885ALDH1A1 3215/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.