Predicted protein targets (top 4)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.32 |
| ▸ | HSD17B10 | Q99714 | 1/20 | 0.32 |
| ▸ | MEN1 | O00255 | 1/20 | 0.30 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL10377787 | 0.89 | ALDH1A1 (0.38) | ALDH1A1HSD17B10MEN1KMT2A | |
| SCHEMBL333613 | 0.80 | KDM4E (0.35) | — | |
| SCHEMBL10376266 | 0.79 | KDM4E (0.33) | ALDH1A1HSD17B10MEN1KMT2A | |
| SCHEMBL28672514 | 0.78 | KDM4E (0.34) | — | |
| SCHEMBL22713825 | 0.78 | KDM4E (0.34) | — | |
| SCHEMBL10377773 | 0.74 | ALDH1A1 (0.33) | ALDH1A1HSD17B10MEN1KMT2A | |
| SCHEMBL10376225 | 0.74 | ALDH1A1 (0.33) | ALDH1A1HSD17B10MEN1KMT2A | |
| SCHEMBL250358 | 0.74 | ALDH1A1 (0.33) | ALDH1A1HSD17B10MEN1KMT2A | |
| SCHEMBL1991322 | 0.71 | ALDH1A1 (0.32) | ALDH1A1HSD17B10MEN1KMT2A | |
| SCHEMBL1993063 | 0.71 | ALDH1A1 (0.32) | ALDH1A1HSD17B10MEN1KMT2A |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 9 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-10359700-B2 | Salt, acid generator, photoresist composition and process of producing photoresist pattern | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2019-07-23 | — | — | US | disclosed |
| US-20150338735-A1 | SALT, ACID GENERATOR, PHOTORESIST COMPOSITION AND PROCESS OF PRODUCING PHOTORESIST PATTERN | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2015-11-26 | — | — | US | disclosed |
| US-9176379-B2 | Resist composition and method for producing resist pattern | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2015-11-03 | — | — | US | disclosed |
| EP-1812149-B1 | SEMIPERMEABLE COMPOSITE MEMBRANE, PRODUCTION PROCESS THEREOF AND TREATMENT METHOD FOR BORON-CONTAINING WATER | TORAY INDUSTRIES (JP) | 2013-06-12 | — | — | EP | disclosed |
| US-20120264059-A1 | RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2012-10-18 | — | — | US | disclosed |
| US-7641054-B2 | Composite semipermeable membrane, production process thereof, and element, fluid separation equipment and treatment method for boron-containing water using the same | TORAY INDUSTRIES, INC. (JP) | 2010-01-05 | — | — | US | disclosed |
| US-20080000843-A1 | Composite Semipermeable Membrane, Production Process Thereof, and Element, Fluid Separation Equipment and Treatment Method for Boron-Containing Water Using the Same | TORAY INDUSTRIES, INC. (JP) | 2008-01-03 | — | — | US | disclosed |
| EP-1812149-A1 | COMPOSITE SEMIPERMEABLE MEMBRANE, PRODUCTION PROCESS THEREOF, AND ELEMENT, FLUID SEPARATION EQUIPMENT AND TREATMENT METHOD FOR BORON-CONTAINING WATER USING THE SAME | TORAY INDUSTRIES, INC. (JP) | 2007-08-01 | — | — | EP | disclosed |
| WO-2006051888-A1 | COMPOSITE SEMIPERMEABLE MEMBRANE, PRODUCTION PROCESS THEREOF, AND ELEMENT, FLUID SEPARATION EQUIPMENT AND TREATMENT METHOD FOR BORON-CONTAINING WATER USING THE SAME | TORAY INDUSTRIES, INC. (JP) | 2006-05-18 | — | — | WO | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (2 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20150338735-A1 | SALT, ACID GENERATOR, PHOTORESIST COMPOSITION AND PROCESS OF PRODUCING PHOTORESIST PATTERN | CBR1, CBR3, C1R | ALDH1A1 2184/4885HSD17B10 927/4885MEN1 2555/4885 |
| US-10359700-B2 | Salt, acid generator, photoresist composition and process of producing photoresist pattern | CBR1, CBR3, C1R | ALDH1A1 2184/4885HSD17B10 927/4885MEN1 2555/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.