SCHEMBL28874679

SCHEMBL28874679

C=CCc1cccc(C(=O)Cl)c1Cl

nearest known ligand 0.44

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
GABRA1 P14867 1/20 0.44
GABRB2 P47870 1/20 0.44
HPGD P15428 3/20 0.38
CYP1A2 P05177 2/20 0.38
KDM4E B2RXH2 5/20 0.38
MAPT P10636 3/20 0.38
MEN1 O00255 2/20 0.38
HTT P42858 2/20 0.38
KMT2A Q03164 2/20 0.38
TP53 P04637 1/20 0.38
ALDH1A1 P00352 5/20 0.37
HSD17B10 Q99714 5/20 0.37
PTGDR Q13258 1/20 0.37
PTGDR2 Q9Y5Y4 1/20 0.37
ALOX15 P16050 1/20 0.36
CYP3A4 P08684 2/20 0.36
CYP2C19 P33261 1/20 0.36
SMN1; SMN2 Q16637 1/20 0.36
AKR1B1 P15121 1/20 0.36
TSHR P16473 1/20 0.35

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL10930845 0.88 GABRA1 (0.46) GABRA1GABRB2HPGDCYP1A2KDM4E
SCHEMBL28740017 0.86 TSHR (0.52) GABRA1GABRB2HPGDCYP1A2MAPT
SCHEMBL2161892 0.84 GABRA1 (0.44) GABRA1GABRB2HPGDCYP1A2KDM4E
SCHEMBL2183899 0.83 GABRA1 (0.44) GABRA1GABRB2HPGDCYP1A2KDM4E
SCHEMBL16966280 0.82 GABRA1 (0.41) GABRA1GABRB2HPGDCYP1A2KDM4E
SCHEMBL27592816 0.81 KDM4E (0.46) GABRA1GABRB2KDM4EMAPTMEN1
SCHEMBL29276543 0.79 GABRA1 (0.44) GABRA1GABRB2KDM4EMAPTMEN1
SCHEMBL6905440 0.78 GABRA1 (0.45) GABRA1GABRB2HTTKMT2AALDH1A1
SCHEMBL9278463 0.78 ALDH1A1 (0.41) GABRA1GABRB2HPGDCYP1A2KDM4E
SCHEMBL2162561 0.78 GABRA1 (0.50) GABRA1GABRB2HPGDCYP1A2KDM4E

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-109843853-A The manufacturing method of composition and the equipment using the composition 东洋合成工业株式会社 2019-06-04 CN disclosed