SCHEMBL2887915

SCHEMBL2887915

O=S(=O)(Oc1ccc(C2CCCCC2)cc1)C(F)(F)C(F)(F)C(F)(F)C(F)(F)F

nearest known ligand 0.45

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
DRD2 P14416 1/20 0.45
DRD1 P21728 1/20 0.45
DRD4 P21917 1/20 0.45
DRD5 P21918 1/20 0.45
DRD3 P35462 1/20 0.45
LMNA P02545 2/20 0.42
HTT P42858 1/20 0.42
CA1 P00915 4/20 0.40
CA2 P00918 4/20 0.40
THRB P10828 1/20 0.38
MEN1 O00255 1/20 0.37
KMT2A Q03164 1/20 0.37
SMN1; SMN2 Q16637 3/20 0.36
KCNH2 Q12809 1/20 0.36
HRH3 Q9Y5N1 1/20 0.36
HAO1 Q9UJM8 1/20 0.36
ALDH1A1 P00352 2/20 0.35
MAPT P10636 2/20 0.35
APOBEC3A P31941 1/20 0.35
APOBEC3G Q9HC16 1/20 0.35

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Diphenylsulfane SCHEMBL192464 0.89 DRD2 (0.41) DRD2DRD1DRD4DRD5DRD3
SCHEMBL6047885 0.87 DRD2 (0.44) DRD2DRD1DRD4DRD5DRD3
SCHEMBL110631 0.87 DRD2 (0.47) DRD2DRD1DRD4DRD5DRD3
SCHEMBL17707967 0.86 DRD2 (0.44) DRD2DRD1DRD4DRD5DRD3
SCHEMBL13898699 0.86 DRD2 (0.46) DRD2DRD1DRD4DRD5DRD3
SCHEMBL1687750 0.86 DRD2 (0.46) DRD2DRD1DRD4DRD5DRD3
SCHEMBL14013662 0.86 DRD2 (0.46) DRD2DRD1DRD4DRD5DRD3
SCHEMBL14040497 0.85 DRD2 (0.43) DRD2DRD1DRD4DRD5DRD3
SCHEMBL3436101 0.84 DRD2 (0.50) DRD2DRD1DRD4DRD5DRD3
SCHEMBL9957718 0.83 DRD2 (0.60) DRD2DRD1DRD4DRD5DRD3

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8431324-B2 Radiation-sensitive resin composition JSR CORPORATION (JP) 2013-04-30 US disclosed
US-20100285405-A1 RADIATION-SENSITIVE RESIN COMPOSITION JSR CORPORATION (JP) 2010-11-11 US disclosed