Predicted protein targets (top 9)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | IDO1 | P14902 | 3/20 | 0.39 |
| ▸ | SLC6A4 | P31645 | 5/20 | 0.39 |
| ▸ | SLC6A2 | P23975 | 4/20 | 0.38 |
| ▸ | TTR | P02766 | 1/20 | 0.36 |
| ▸ | TP53 | P04637 | 1/20 | 0.32 |
| ▸ | ERN1 | O75460 | 1/20 | 0.31 |
| ▸ | TYR | P14679 | 1/20 | 0.31 |
| ▸ | CYP3A4 | P08684 | 1/20 | 0.30 |
| ▸ | APOBEC3G | Q9HC16 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL6156516 | 0.82 | SLC6A4 (0.43) | IDO1SLC6A4SLC6A2ERN1TYR | |
| SCHEMBL22288324 | 0.81 | HTR2C (0.35) | IDO1SLC6A4TTRTYR | |
| SCHEMBL28879920 | 0.80 | SLC6A4 (0.42) | IDO1SLC6A4SLC6A2TTRTP53 | |
| SCHEMBL4290170 | 0.78 | TYR (0.39) | IDO1SLC6A4SLC6A2TP53ERN1 | |
| SCHEMBL17151862 | 0.78 | EGFR (0.43) | SLC6A4SLC6A2TTRTP53 | |
| SCHEMBL18243053 | 0.77 | IDO1 (0.36) | IDO1SLC6A4SLC6A2TTRERN1 | |
| SCHEMBL283006 | 0.77 | IDO1 (0.36) | IDO1SLC6A4SLC6A2TTR | |
| SCHEMBL23680033 | 0.76 | IDO1 (0.41) | IDO1SLC6A4SLC6A2TP53TYR | |
| SCHEMBL1197989 | 0.76 | IDO1 (0.41) | IDO1SLC6A4CYP3A4 | |
| SCHEMBL15196307 | 0.76 | TRPA1 (0.36) | TP53 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-122070309-A | Composition, resin composition, film-forming composition for lithography, and resist film-forming composition | 三菱瓦斯化学株式会社 | 2026-05-19 | — | — | CN | disclosed |
| WO-2025079631-A1 | COMPOSITION, RESIN COMPOSITION, COMPOSITION FOR FILM FORMATION, COMPOSITION FOR FORMING LITHOGRAPHIC FILM, AND COMPOSITION FOR FORMING RESIST FILM | 三菱瓦斯化学株式会社 | 2025-04-17 | — | — | WO | disclosed |
| CN-114956933-A | Marker containing isotope oxygen atom and preparation method and application thereof | 清华大学 | 2022-08-30 | — | — | CN | disclosed |