SCHEMBL28892016

SCHEMBL28892016

O=Cc1c(O)c(O)c2ccc3cccc4ccc1c2c34

nearest known ligand 0.44

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ERN1 O75460 7/20 0.44
PADI4 Q9UM07 1/20 0.44
ALDH1A1 P00352 4/20 0.39
HPGD P15428 4/20 0.39
HSD17B10 Q99714 3/20 0.39
CYP1A2 P05177 3/20 0.39
CYP3A4 P08684 2/20 0.39
TSHR P16473 2/20 0.39
CYP1A1 P04798 1/20 0.39
CYP1B1 Q16678 1/20 0.39
TDP1 Q9NUW8 1/20 0.37
L3MBTL1 Q9Y468 1/20 0.37
CDK2 P24941 1/20 0.37
KDM4E B2RXH2 2/20 0.37
MAPT P10636 1/20 0.37
ALB P02768 1/20 0.36
KMT2A Q03164 3/20 0.35
MEN1 O00255 2/20 0.35
ERBB2 P04626 1/20 0.35
FYN P06241 1/20 0.35

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL29968179 1.00 ERN1 (0.44) ERN1PADI4ALDH1A1HPGDHSD17B10
SCHEMBL548054 0.83 ALDH1A1 (0.48) ERN1ALDH1A1HPGDHSD17B10CYP1A2
SCHEMBL28171921 0.81 ERN1 (0.48) ERN1PADI4ALDH1A1HPGDHSD17B10
SCHEMBL22159811 0.77 ERN1 (0.51) ERN1ALDH1A1HPGDHSD17B10CYP1A2
SCHEMBL548870 0.76 CYP1A2 (0.54) ERN1PADI4ALDH1A1HPGDHSD17B10
SCHEMBL547987 0.75 KMT2A (0.43) ERN1ALDH1A1HPGDHSD17B10CYP1A2
SCHEMBL28219485 0.74 ALDH1A1 (0.54) ERN1PADI4ALDH1A1HPGDHSD17B10
SCHEMBL28401082 0.74 ERN1 (0.46) ERN1ALDH1A1HPGDHSD17B10CYP1A2
SCHEMBL548370 0.71 CYP1A2 (0.47) ERN1ALDH1A1HPGDHSD17B10CYP1A2
SCHEMBL29968575 0.71 ALDH1A1 (0.38) ERN1ALDH1A1HPGDHSD17B10CYP1A2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-115202153-A Hard mask composition, hard mask layer and method for forming pattern 三星SDI株式会社 2022-10-18 CN claimed
CN-115202153-A Hard mask composition, hard mask layer and method for forming pattern 三星SDI株式会社 2022-10-18 CN disclosed