SCHEMBL29968575

SCHEMBL29968575

COc1c(C=O)c2ccc3cccc4ccc(c1OC)c2c34

nearest known ligand 0.38

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 4/20 0.38
ERN1 O75460 4/20 0.38
HPGD P15428 3/20 0.38
CYP3A4 P08684 2/20 0.38
TSHR P16473 2/20 0.38
HSD17B10 Q99714 2/20 0.38
TDP1 Q9NUW8 2/20 0.38
L3MBTL1 Q9Y468 2/20 0.38
CA1 P00915 1/20 0.37
CA2 P00918 1/20 0.37
CYP1A2 P05177 2/20 0.36
MAPT P10636 2/20 0.36
CYP2C9 P11712 1/20 0.36
CYP2C19 P33261 1/20 0.36
CYP1A1 P04798 1/20 0.35
CYP1B1 Q16678 1/20 0.35
AKR1B1 P15121 2/20 0.35
KDM4E B2RXH2 1/20 0.34
MCL1 Q07820 1/20 0.33
GAA P10253 1/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL28891982 1.00 ALDH1A1 (0.38) ALDH1A1ERN1HPGDCYP3A4TSHR
SCHEMBL28171921 0.86 ERN1 (0.48) ALDH1A1ERN1HPGDCYP3A4TSHR
SCHEMBL548054 0.79 ALDH1A1 (0.48) ALDH1A1ERN1HPGDCYP3A4TSHR
SCHEMBL29070912 0.76 ERN1 (0.50) ALDH1A1ERN1HPGDCYP3A4TSHR
SCHEMBL28892002 0.76 CYP1A2 (0.42) ALDH1A1ERN1HPGDCYP3A4TSHR
SCHEMBL16335901 0.73 ALDH1A1 (0.56) ALDH1A1HPGDCYP3A4TSHRHSD17B10
SCHEMBL548870 0.73 CYP1A2 (0.54) ALDH1A1ERN1HPGDCYP3A4TSHR
SCHEMBL29968179 0.71 ERN1 (0.44) ALDH1A1ERN1HPGDCYP3A4TSHR
SCHEMBL28892016 0.71 ERN1 (0.44) ALDH1A1ERN1HPGDCYP3A4TSHR
SCHEMBL22634174 0.71 ERN1 (0.42) ALDH1A1ERN1CYP3A4TSHRHSD17B10

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20220315790-A1 HARDMASK COMPOSITION, HARDMASK LAYER AND METHOD OF FORMING PATTERNS SAMSUNG SDI CO., LTD. (KR) 2022-10-06 US claimed
US-20220315790-A1 HARDMASK COMPOSITION, HARDMASK LAYER AND METHOD OF FORMING PATTERNS SAMSUNG SDI CO., LTD. (KR) 2022-10-06 US disclosed