SCHEMBL28909697

SCHEMBL28909697

Cc1ccccc1Oc1c2ccccc2c(C)c2ccccc12

nearest known ligand 0.48

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
SMN1; SMN2 Q16637 4/20 0.48
TSHR P16473 2/20 0.48
MEN1 O00255 2/20 0.48
KMT2A Q03164 2/20 0.48
NPC1 O15118 1/20 0.48
RAB9A P51151 1/20 0.48
HTT P42858 2/20 0.40
TP53 P04637 1/20 0.40
RXFP1 Q9HBX9 1/20 0.40
NPSR1 Q6W5P4 1/20 0.40
ALDH1A1 P00352 3/20 0.39
KDM4E B2RXH2 1/20 0.39
MAPK1 P28482 1/20 0.39
CYP1A2 P05177 4/20 0.39
MRGPRX1 Q96LB2 2/20 0.39
CYP2C19 P33261 2/20 0.39
CYP2A6 P11509 2/20 0.37
AR P10275 3/20 0.37
HPGD P15428 2/20 0.37
LMNA P02545 1/20 0.37

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL30463389 0.94 SMN1; SMN2 (0.54) SMN1; SMN2TSHRMEN1KMT2ANPC1
SCHEMBL29510106 0.81 MEN1 (0.43) SMN1; SMN2TSHRMEN1KMT2ANPC1
SCHEMBL9486976 0.78 TSHR (0.56) SMN1; SMN2TSHRMEN1KMT2ANPC1
SCHEMBL28909699 0.77 L3MBTL1 (0.47) KMT2ANPSR1KDM4EARHPGD
SCHEMBL9487832 0.77 TSHR (0.50) SMN1; SMN2TSHRMEN1KMT2ANPC1
SCHEMBL127000 0.77 TSHR (0.65) SMN1; SMN2TSHRMEN1KMT2ANPC1
SCHEMBL29637724 0.77 TSHR (0.65) SMN1; SMN2TSHRMEN1KMT2ANPC1
Phosphine SCHEMBL22634020 0.74 TSHR (0.62) SMN1; SMN2TSHRMEN1KMT2ANPC1
Fluoride SCHEMBL27757467 0.74 TSHR (0.62) SMN1; SMN2TSHRMEN1KMT2ANPC1
SCHEMBL16920392 0.74 KDM4E (0.57) SMN1; SMN2TSHRMEN1KMT2ARAB9A

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-109799680-B Chemically amplified positive photosensitive resin composition and use thereof 奇美实业股份有限公司 2023-03-10 CN disclosed
CN-108241257-B Chemically amplified positive photosensitive resin composition, method for producing substrate with mold, and method for producing molded article by plating 奇美实业股份有限公司 2022-11-08 CN disclosed