SCHEMBL289228

SCHEMBL289228

C=C(C)C(=O)OC[CH]C

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL5654625 0.83 TSHR (0.52)
SCHEMBL9615554 0.83 TSHR (0.52)
SCHEMBL1636584 0.83 TSHR (0.52)
SCHEMBL1636583 0.83 TSHR (0.52)
SCHEMBL453100 0.82 TSHR (0.47)
SCHEMBL7521766 0.82 TSHR (0.47)
SCHEMBL9123347 0.81
SCHEMBL1006624 0.81
SCHEMBL1057516 0.81 TSHR (0.50)
SCHEMBL22017 0.81

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 53 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-102924655-B High-strength temperature resistant viscoelastic polymer for profile control SUN ANSHUN 2014-07-09 CN claimed
CN-102924655-A High-strength temperature resistant viscoelastic polymer for profile control SUN ANSHUN 2013-02-13 CN claimed
CN-1061033-A The gel acid that acidifying strata is used SICHUAN PETROLEUM ADMINISTRATION (CN) 1992-05-13 CN claimed
US-4404150-A DENTAL FILLINGS SANKIN INDUSTRY CO., LTD. (JP) 1983-09-13 US claimed
CN-105446077-B Photosensitive polymer combination 东友精细化工有限公司 2019-10-25 CN disclosed
CN-110147031-A The manufacturing method and display device of photosensitive polymer combination, heat-resistant resin film 东丽株式会社 2019-08-20 CN disclosed
CN-104854508-B The manufacturing method and display device of photosensitive polymer combination, heat-resistant resin film 东丽株式会社 2019-05-07 CN disclosed
CN-109196028-A Method for improving surface modification by using alkyl borane 巴斯夫欧洲公司 2019-01-11 CN disclosed
CN-109031886-A Photosensitive composition and shading spacer prepared therefrom 罗门哈斯电子材料韩国有限公司 2018-12-18 CN disclosed
CN-106283247-B Poly ion liquid nano-fiber material and preparation method thereof for carbon dioxide adsorption 东华大学 2018-12-04 CN disclosed
CN-108803268-A Positively charged toner 京瓷办公信息系统株式会社 2018-11-13 CN disclosed
CN-106104875-B Binder composition for secondary battery electrode, slurry for secondary battery electrode composition, electrode for secondary battery and secondary cell 日本瑞翁株式会社 2018-09-28 CN disclosed
WO-2009146977-A1 AQUEOUS DISPERSIONS COMPRISING AT LEAST ONE ALKYD RESIN EVONIK RÖHM GMBH (DE) 2009-12-10 WO disclosed
WO-2009146995-A1 MONOMER MIXTURES, POLYMERS AND COATING COMPOSITIONS EVONIK RÖHM GMBH (DE) 2009-12-10 WO disclosed
CN-101481607-A Acid liquor gel for acidified fracturing, as well as preparation method and use thereof UNIV CHINA PETROLEUM (CN) 2009-07-15 CN disclosed
EP-1185574-A2 POLY(MERCAPTOPROPYLARYL) CURATIVES Lord Corporation (US) 2002-03-13 EP disclosed
WO-2001000698-A2 POLY(MERCAPTOPROPYLARYL) CURATIVES LORD CORPORATION (US) 2001-01-04 WO disclosed
CN-1061033-A The gel acid that acidifying strata is used SICHUAN PETROLEUM ADMINISTRATION (CN) 1992-05-13 CN disclosed
US-5009986-A Solubility in organic solvents, durability, compatibility with polymers TEIJIN LIMITED (JP) 1991-04-23 US disclosed
EP-0379277-A2 Napthtalocyanine based compound and optical recording medium containing the same TEIJIN LIMITED (JP) 1990-07-25 EP disclosed