SCHEMBL7521766

SCHEMBL7521766

C=C(C)C(=O)OC/C=C/C

nearest known ligand 0.47

Predicted protein targets (top 7)

geneUniProtsupporting neighboursconfidence
TSHR P16473 3/20 0.47
THRB P10828 1/20 0.44
ALDH1A1 P00352 3/20 0.41
POLB P06746 1/20 0.33
APEX1 P27695 1/20 0.33
HTT P42858 1/20 0.33
TDP1 Q9NUW8 1/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL453100 1.00 TSHR (0.47) TSHRTHRBALDH1A1POLBAPEX1
SCHEMBL1636583 0.89 TSHR (0.52) TSHRTHRBALDH1A1POLBAPEX1
SCHEMBL5654625 0.89 TSHR (0.52) TSHRTHRBALDH1A1POLBAPEX1
SCHEMBL1636584 0.89 TSHR (0.52) TSHRTHRBALDH1A1POLBAPEX1
SCHEMBL934760 0.86 TSHR (0.42) TSHRTHRBALDH1A1POLBAPEX1
SCHEMBL11116608 0.86 TSHR (0.42) TSHRTHRBALDH1A1POLBAPEX1
SCHEMBL934759 0.86 TSHR (0.42) TSHRTHRBALDH1A1POLBAPEX1
SCHEMBL8943371 0.83 THRB (0.59) TSHRTHRBALDH1A1POLBAPEX1
SCHEMBL37916 0.83 TSHR (0.47) TSHRTHRBALDH1A1POLBAPEX1
SCHEMBL10606524 0.83 TSHR (0.47) TSHRTHRBALDH1A1POLBAPEX1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 243 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-4777116-A RADIATION OF A MASKED THIN FILM OF A (METH)ACRYLATE POLYMER AND REACTIVE AROMATIC ALDEHYDE AND KETONE KURARAY CO., LTD. (JP) 1988-10-11 US claimed
US-4687727-A Light-sensitive planographic printing plate with layer of diazo resin containing photopolymerizable composition FUJI PHOTO FILM CO., LTD. (JP) 1987-08-18 US claimed
US-12620622-B2 Compound including sulfur-containing heterocyclic cation and bis(oxolato)borate anion, electrolytic solution and electrochemical device including the same DAIKIN INDUSTRIES, LTD. (JP) 2026-05-05 US disclosed
US-20260020362-A1 RIBBED SUBSTRATE AND OPTICAL SEMICONDUCTOR DEVICE KANEKA CORP (JP) 2026-01-15 US disclosed
US-20250260063-A1 ELECTROLYTIC SOLUTION, ELECTROCHEMICAL DEVICE, SECONDARY BATTERY, AND LITHIUM-ION SECONDARY BATTERY DAIKIN INDUSTRIES, LTD. (JP) 2025-08-14 US disclosed
EP-3780232-B1 ELECTROLYTIC SOLUTION, ELECTROCHEMICAL DEVICE, LITHIUM-ION SECONDARY BATTERY, AND MODULE DAIKIN IND LTD (JP) 2025-07-30 EP disclosed
US-20250233206-A1 NON-AQUEOUS ELECTROLYTE SOLUTION AND NON-AQUEOUS ELECTROLYTE SECONDARY BATTERY EMPLOYING THE SAME MITSUBISHI CHEMICAL CORPORATION (JP) 2025-07-17 US disclosed
EP-3998164-B1 INK AND INK-JET RECORDING METHOD NIPPON KAYAKU KK (JP) 2025-06-25 EP disclosed
CN-120058549-A Polymers having an upper critical dissolution temperature in aqueous solution 波音公司 2025-05-30 CN disclosed
US-20250174720-A1 ELECTROLYTE, ELECTROCHEMICAL DEVICE, LITHIUM ION SECONDARY BATTERY, AND MODULE DAIKIN INDUSTRIES, LTD. (JP) 2025-05-29 US disclosed
US-12315885-B2 Electrolytic solution, electrochemical device, lithium-ion secondary battery, and module DAIKIN INDUSTRIES, LTD. (JP) 2025-05-27 US disclosed
US-5416147-A Hydrosilylative composition and process of hydrosilylation reaction SHIN-ETSU CHEMICAL CO., LTD. (JP) 1995-05-16 US disclosed
US-5389497-A Ultraviolet curing of thermosetting resin, removing uncured photosensitive resin; negatives or positives NIPPON PAINT CO., LTD. (JP) 1995-02-14 US disclosed
EP-0602933-A2 Hydrosilylative compositions and hydrosilylation reaction processes SHIN-ETSU CHEMICAL CO., LTD. (JP) 1994-06-22 EP disclosed
EP-0220652-B1 Method for manufacturing phase gratings of a combination pattern-refraction modification type KURARAY CO (JP) 1994-02-02 EP disclosed
EP-0573031-A2 Method for forming patterned solder mask Nippon Paint Co., Ltd. (JP) 1993-12-08 EP disclosed
EP-0566095-A1 Curable resin composition NIPPON PAINT CO., LTD. (JP) 1993-10-20 EP disclosed
US-4777116-A RADIATION OF A MASKED THIN FILM OF A (METH)ACRYLATE POLYMER AND REACTIVE AROMATIC ALDEHYDE AND KETONE KURARAY CO., LTD. (JP) 1988-10-11 US disclosed
US-4725629-A Process of making an interpenetrating superabsorbent polyurethane foam KIMBERLY-CLARK CORPORATION (US) 1988-02-16 US disclosed
EP-0220652-A2 Method for manufacturing phase gratings of a combination pattern-refraction modification type Kuraray Co., Ltd. (JP) 1987-05-06 EP disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (3 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20260020362-A1 RIBBED SUBSTRATE AND OPTICAL SEMICONDUCTOR DEVICE SOST, CASK, STRADA TSHR 4144/4885THRB 3843/4885ALDH1A1 477/4885
US-20250174720-A1 ELECTROLYTE, ELECTROCHEMICAL DEVICE, LITHIUM ION SECONDARY BATTERY, AND MODULE HCN2, HCN1, HCN3 TSHR 1091/4885THRB 957/4885ALDH1A1 955/4885
US-12620622-B2 Compound including sulfur-containing heterocyclic cation and bis(oxolato)borate anion, electrolytic solution and electrochemical device including the same ASH2L, OLA1, ODC1 TSHR 2348/4885THRB 845/4885ALDH1A1 1584/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.