SCHEMBL28933733

SCHEMBL28933733

OB(O[Si](O)(O)O)O[Si](O)(O)O

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL28933775 0.75
SCHEMBL20235881 0.64
Boric Acid SCHEMBL28675895 0.61 LMNA (0.50)
SCHEMBL27647706 0.58
Boric Acid SCHEMBL11040875 0.58 LMNA (0.44)
Boric Acid SCHEMBL1553925 0.55
SCHEMBL23354573 0.52
Boric Acid SCHEMBL36428 0.52
Boric Acid SCHEMBL1472037 0.52 LMNA (0.80)
SCHEMBL2868965 0.52

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-116135948-A Chemical etching composition and application thereof 安集微电子(上海)有限公司 2023-05-19 CN claimed
CN-115584263-A Chemical etching composition and application thereof 安集微电子(上海)有限公司 2023-01-10 CN claimed
CN-116135948-A Chemical etching composition and application thereof 安集微电子(上海)有限公司 2023-05-19 CN disclosed
CN-115584263-A Chemical etching composition and application thereof 安集微电子(上海)有限公司 2023-01-10 CN disclosed