SCHEMBL28944602

SCHEMBL28944602

C=CCNOC(C)=O.C=CCOS(=O)(=O)OCC=C

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL1154368 0.84
SCHEMBL4861380 0.82
Sulfur Dioxide SCHEMBL28461511 0.78 TSHR (0.33)
SCHEMBL11874660 0.74 TSHR (0.32)
SCHEMBL29656 0.73 CA2 (0.39)
Allylamine SCHEMBL28944603 0.72 ALDH1A1 (0.35)
Sulfuric Acid SCHEMBL6461430 0.71 CA2 (0.34)
SCHEMBL20526044 0.71 CA2 (0.37)
Ammonia Solution, Strong SCHEMBL4653036 0.71 CA2 (0.37)
SCHEMBL27791503 0.71 BTN3A1 (0.33)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-111526994-B Printing pretreatment liquid, printing base material, and image recording method 富士胶片株式会社 2022-07-08 CN disclosed