⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL1024573 | 0.82 | NOS3 (0.31) | — | |
| SCHEMBL17459898 | 0.82 | NOS3 (0.31) | — | |
| SCHEMBL2933677 | 0.81 | — | — | |
| SCHEMBL28774141 | 0.80 | — | — | |
| SCHEMBL28628369 | 0.78 | — | — | |
| Hydrochloric Acid SCHEMBL6264288 | 0.76 | — | — | |
| Hydrochloric Acid SCHEMBL6266097 | 0.76 | — | — | |
| SCHEMBL16206286 | 0.75 | CYP3A4 (0.32) | — | |
| Hydrochloric Acid SCHEMBL11804483 | 0.75 | CA12 (0.39) | — | |
| Hydrochloric Acid SCHEMBL6264892 | 0.73 | MLYCD (0.30) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 17 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-2581160-Y | Multifunctional warm fabric product capable of preventing SARS | SHANGHAI TIANNIAN HIGH SCIENCE | 2003-10-22 | — | — | CN | claimed |
| US-6599370-B2 | Stabilized alkaline compositions for cleaning microelectronic substrates | MALLINCKRODT INC. | 2003-07-29 | — | — | US | claimed |
| US-6585825-B1 | Metal ion free solution containing base, silicate, stabilizer and water; removing photoresist residues and other metallic and organic contaminates from semiconductor wafers without damaging | MALLINCKRODT INC | 2003-07-01 | — | — | US | claimed |
| EP-2648675-A1 | HAIR RELAXING AND STRAIGHTENING COMPOSITIONS | International Flora Technologies, Ltd. (US) | 2013-10-16 | — | — | EP | disclosed |
| WO-2012078658-A1 | HAIR RELAXING AND STRAIGHTENING COMPOSITIONS | INTERNATIONAL FLORA TECHNOLOGIES, LTD. (US) | 2012-06-14 | — | — | WO | disclosed |
| US-20120148517-A1 | Hair Relaxing and Straightening Compositions | INTERNATIONAL FLORA TECHNOLOGIES, LTD. (US) | 2012-06-14 | — | — | US | disclosed |
| US-7671001-B2 | Alkaline, post plasma etch/ash residue removers and photoresist stripping compositions containing metal-halide corrosion inhibitors | MALLINCKRODT BAKER, INC. (US) | 2010-03-02 | — | — | US | disclosed |
| US-20070060490-A1 | Alkaline, post plasma etch/ash residue removers and photoresist stripping compositions containing metal-halide corrosion inhibitors | AVANTOR PERFORMANCE MATERIALS, INC. | 2007-03-15 | — | — | US | disclosed |
| EP-1692572-A2 | ALKALINE, POST PLASMA ETCH/ASH RESIDUE REMOVERS AND PHOTORESIST STRIPPING COMPOSITIONS CONTAINING METAL-HALIDE CORROSION INHIBITORS | Mallinckrodt Baker, Inc. (US) | 2006-08-23 | — | — | EP | disclosed |
| WO-2005043245-A2 | ALKALINE, POST PLASMA ETCH/ASH RESIDUE REMOVERS AND PHOTORESIST STRIPPING COMPOSITIONS CONTAINING METAL-HALIDE CORROSION INHIBITORS | MALLINCKRODT BAKER INC. (US) | 2005-05-12 | — | — | WO | disclosed |
| EP-1326951-B1 | STABILIZED ALKALINE COMPOSITIONS FOR CLEANING MICROELECTRONIC SUBSTRATES | MALLINCKRODT BAKER INC (US) | 2005-02-02 | — | — | EP | disclosed |
| CN-2581160-Y | Multifunctional warm fabric product capable of preventing SARS | SHANGHAI TIANNIAN HIGH SCIENCE | 2003-10-22 | — | — | CN | disclosed |
| US-6599370-B2 | Stabilized alkaline compositions for cleaning microelectronic substrates | MALLINCKRODT INC. | 2003-07-29 | — | — | US | disclosed |
| EP-1326951-A1 | STABILIZED ALKALINE COMPOSITIONS FOR CLEANING MICROELECTRONIC SUBSTRATES | Mallinckrodt Baker, Inc. (US) | 2003-07-16 | — | — | EP | disclosed |
| US-6585825-B1 | Metal ion free solution containing base, silicate, stabilizer and water; removing photoresist residues and other metallic and organic contaminates from semiconductor wafers without damaging | MALLINCKRODT INC | 2003-07-01 | — | — | US | disclosed |
| US-20020077259-A1 | Stabilized alkaline compositions for cleaning microlelectronic substrates | AVANTOR PERFORMANCE MATERIALS, LLC | 2002-06-20 | — | — | US | disclosed |
| WO-2002033033-A1 | STABILIZED ALKALINE COMPOSITIONS FOR CLEANING MICROELECTRONIC SUBSTRATES | MALLINCKRODT BAKER, INC. (US) | 2002-04-25 | — | — | WO | disclosed |