SCHEMBL28980851

SCHEMBL28980851

[SiH3]N([Ti])C1=CC=CC1

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL517101 0.73
SCHEMBL9163351 0.70
SCHEMBL5705399 0.69
SCHEMBL24010753 0.67
Hydrochloric Acid SCHEMBL392381 0.67
Hydrochloric Acid SCHEMBL4482101 0.67
SCHEMBL24403554 0.67
SCHEMBL29141986 0.67
SCHEMBL10865401 0.67
SCHEMBL28437466 0.65

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-115943227-B Method for forming dielectric film, novel precursor and use thereof in semiconductor manufacture 乔治洛德方法研究和开发液化空气有限公司 2025-06-24 CN disclosed
CN-115943227-A Method for forming dielectric films, novel precursors and their use in semiconductor manufacturing 乔治洛德方法研究和开发液化空气有限公司 2023-04-07 CN disclosed