⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL24403554 | 0.80 | — | — | |
| SCHEMBL9163351 | 0.79 | — | — | |
| SCHEMBL3784663 | 0.78 | ALDH1A1 (0.37) | — | |
| SCHEMBL5705399 | 0.77 | — | — | |
| SCHEMBL29141986 | 0.75 | — | — | |
| SCHEMBL10865401 | 0.75 | — | — | |
| Hydrochloric Acid SCHEMBL4482101 | 0.75 | — | — | |
| Hydrochloric Acid SCHEMBL392381 | 0.75 | — | — | |
| SCHEMBL28980851 | 0.73 | — | — | |
| SCHEMBL6809392 | 0.71 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 44 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-2738010-A1 | RESIN COMPOSITION FOR LASER ENGRAVING, RELIEF PRINTING PLATE PRECURSOR FOR LASER ENGRAVING, PROCESS FOR PRODUCING RELIEF PRINTING PLATE PRECURSOR FOR LASER ENGRAVING, PROCESS FOR PRODUCING RELIEF PRINTING PLATE, AND RELIEF PRINTING PLATE | FUJIFILM Corporation (JP) | 2014-06-04 | — | — | EP | disclosed |
| EP-2481583-B1 | Resin composition for laser engraving, relief printing plate precursor for laser engraving, and relief printing plate and process for making the same | FUJIFILM CORP (JP) | 2014-05-28 | — | — | EP | disclosed |
| US-20140130693-A1 | RESIN COMPOSITION FOR LASER ENGRAVING, RELIEF PRINTING PLATE PRECURSOR FOR LASER ENGRAVING, PROCESS FOR PRODUCING RELIEF PRINTING PLATE PRECURSOR FOR LASER ENGRAVING, PROCESS FOR MAKING RELIEF PRINTING PLATE, AND RELIEF PRINTING PLATE | FUJIFILM CORPORATION (JP) | 2014-05-15 | — | — | US | disclosed |
| EP-2393666-B1 | RELIEF PRINTING PLATE | FUJIFILM CORP (JP) | 2014-01-15 | — | — | EP | disclosed |
| US-8618208-B2 | Resin composition for laser engraving, relief printing plate precursor for laser engraving and process for producing the same, and relief printing plate and process for making the same | FUJIFILM CORPORATION (JP) | 2013-12-31 | — | — | US | disclosed |
| US-8541534-B2 | Resin composition for laser engraving, relief printing plate precursor for laser engraving, relief printing plate and method for producing relief printing plate | FUJIFILM CORPORATION (JP) | 2013-09-24 | — | — | US | disclosed |
| US-20130133537-A1 | RESIN COMPOSITION FOR LASER ENGRAVING, FLEXOGRAPHIC PRINTING PLATE PRECURSOR FOR LASER ENGRAVING AND PROCESS FOR PRODUCING SAME, AND FLEXOGRAPHIC PRINTING PLATE AND PROCESS FOR MAKING SAME | FUJIFILM CORPORATION (JP) | 2013-05-30 | — | — | US | disclosed |
| EP-2565046-A2 | Resin composition for laser engraving, relief printing plate precursor for laser engraving and process for producing same, process for making relief printing plate, and relief printing plate | Fujifilm Corporation (JP) | 2013-03-06 | — | — | EP | disclosed |
| US-20130047878-A1 | RESIN COMPOSITION FOR LASER ENGRAVING, RELIEF PRINTING PLATE PRECURSOR FOR LASER ENGRAVING AND PROCESS FOR PRODUCING SAME, PROCESS FOR MAKING RELIEF PRINTING PLATE, AND RELIEF PRINTING PLATE | FUJIFILM CORPORATION (JP) | 2013-02-28 | — | — | US | disclosed |
| EP-2301750-B1 | Resin composition for laser engraving, relief printing starting plate for laser engraving and process for producing the same | FUJIFILM CORP (JP) | 2012-10-31 | — | — | EP | disclosed |
| EP-0005379-A2 | Photosensitive compositions containing carbonylic halides as activators | Dynachem Corporation (US) | 1979-11-14 | — | — | EP | disclosed |
| US-4130518-A | Preparation of acrylated or methacrylated polymers utilizing a partially solubilized hydrocarbon fraction as the azeotroping medium | CELANESE CORPORATION (US) | 1978-12-19 | — | — | US | disclosed |
| US-4113592-A | ULTRAVIOLET CURABLE COATINGS | CELANESE CORPORATION (US) | 1978-09-12 | — | — | US | disclosed |
| US-4077859-A | Polyunsaturated halogenated monomers for use in ultraviolet coating systems | CELANESE CORPORATION (US) | 1978-03-07 | — | — | US | disclosed |
| US-4077858-A | Completely polymerized ultraviolet cured coatings | CELANESE CORPORATION (US) | 1978-03-07 | — | — | US | disclosed |
| US-4042476-A | TITANIUM DIOXIDE-ACRYLIC POLYMER EMULSION | CELANESE CORPORATION (US) | 1977-08-16 | — | — | US | disclosed |
| US-4035321-A | Preparation of ultraviolet curable acrylated polymers | CELANESE CORPORATION (US) | 1977-07-12 | — | — | US | disclosed |
| US-4016334-A | Method of applying high adhesion ultraviolet curable coatings and coated articles | CELANESE CORPORATION (US) | 1977-04-05 | — | — | US | disclosed |
| US-3992276-A | Unsaturated polyesters for ultraviolet curable coatings | CELANESE CORPORATION (US) | 1976-11-16 | — | — | US | disclosed |
| US-3992275-A | Low gloss ultraviolet curable coatings utilizing α,α,α-trichlorotoluene as a photoinitiator | CELANESE CORPORATION (US) | 1976-11-16 | — | — | US | disclosed |