SCHEMBL2899418

SCHEMBL2899418

CCOC(N)(O)C(C)C

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL29287852 0.97 ALDH1A1 (0.30)
SCHEMBL10790335 0.77
SCHEMBL387804 0.72
SCHEMBL6602092 0.72
SCHEMBL8645121 0.72 ALDH1A1 (0.35)
SCHEMBL22502726 0.71
SCHEMBL2338111 0.71
SCHEMBL19389110 0.70
SCHEMBL27553146 0.70
SCHEMBL27870003 0.70 FDPS (0.40)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 221 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-110506100-A Composite and application method after chemical mechanical grinding ENTEGRIS INC 2019-11-26 CN claimed
CN-110093607-A Deburring liquid, preparation method and application for lead frame 上海新阳半导体材料股份有限公司 2019-08-06 CN claimed
CN-106397730-B The manufacturing method of tertiary amine composition and the composition 赢创德固赛有限公司 2019-03-29 CN claimed
CN-109476803-A It can be used for manufacturing the amine composition of polyurethane foam 赢创德固赛有限公司 2019-03-15 CN claimed
CN-109153762-A For manufacturing the amine catalyst composition of alkenyl halide polyurathamc 东曹株式会社 2019-01-04 CN claimed
CN-105968302-B Material and preparation method thereof is combined for ultralow temperature LNG storage tank storage cold insulation polyurethane coating 江苏长顺高分子材料研究院有限公司 2018-09-04 CN claimed
CN-108342735-A Etching solution for tungsten and GST films 弗萨姆材料美国有限责任公司 2018-07-31 CN claimed
CN-104755518-B Amine catalysts for improving the stability of polyurethane systems with halogen-containing blowing agents 气体产品与化学公司 2017-11-03 CN claimed
CN-107208007-A post-CMP formulations and methods of use thereof 恩特格里斯公司 2017-09-26 CN claimed
CN-106674482-A Polyurethane spraying composition material used for low temperature, cold insulation and flame retardance and preparation method of polyurethane spraying composition material 江苏长顺高分子材料研究院有限公司 2017-05-17 CN claimed
CN-104395989-A Aqueous clean solution with low copper etch rate for organic residue removal improvement ADVANCED TECH MATERIALS 2015-03-04 CN claimed
CN-104334706-A Post-CMP formulation having improved barrier layer compatibility and cleaning performance ENTEGRIS INC 2015-02-04 CN claimed
US-7544218-B2 Method for fabricating a medical device that includes a capacitor that does not require oxide reformation KEMET ELECTRONICS CORPORATION (US) 2009-06-09 US claimed
US-20060187616-A1 Wet tantalum capacitor usable without reformation and medical devices for use therewith KEMET BLUE POWDER CORPORATION 2006-08-24 US claimed
WO-2005000400-A1 WET TANTALUM CAPACITOR USABLE WITHOUT REFORMATION AND MEDICAL DEVICES FOR USE THEREWITH KEMET ELECTRONICS CORPORATION (US) 2005-01-06 WO claimed
US-20040243183-A1 Wet tantalum capacitor usable without reformation and medical devices for use therewith KEMET ELECTRONICS CORPORATION 2004-12-02 US claimed
US-6652729-B2 Containing polyester of 2-methyl-1,3-propane diol and boric acid with dimethyl amino ethoxy ethanol resistance reducer; anodizing valve metal substrates; repairing flaws in anodic oxide coatings KEMET ELECTRONICS CORPORATION 2003-11-25 US claimed
US-20030111355-A1 Electrolyte for very high voltage electrolytic capacitors KEMET ELECTRONICS CORPORATION (US) 2003-06-19 US claimed
US-6480371-B1 Alkanolamine-phosphoric acid anodizing electrolyte KEMET ELECTRONICS CORPORATION 2002-11-12 US claimed
WO-2001057292-A1 ALKANOLAMINE-PHOSPHORIC ACID ANODIZING ELECTROLYTE KEMET ELECTRONICS CORPORATION (US) 2001-08-09 WO claimed