Predicted protein targets (top 19)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | KDM4E | B2RXH2 | 3/20 | 0.33 |
| ▸ | HPGD | P15428 | 3/20 | 0.33 |
| ▸ | TSHR | P16473 | 3/20 | 0.33 |
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.33 |
| ▸ | MAPT | P10636 | 1/20 | 0.33 |
| ▸ | MAPK1 | P28482 | 1/20 | 0.33 |
| ▸ | HSD17B10 | Q99714 | 1/20 | 0.33 |
| ▸ | CYP1A2 | P05177 | 1/20 | 0.32 |
| ▸ | CYP2D6 | P10635 | 1/20 | 0.32 |
| ▸ | CYP2C19 | P33261 | 1/20 | 0.32 |
| ▸ | KMT2A | Q03164 | 2/20 | 0.32 |
| ▸ | MEN1 | O00255 | 1/20 | 0.32 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.32 |
| ▸ | LMNA | P02545 | 1/20 | 0.31 |
| ▸ | HTT | P42858 | 1/20 | 0.31 |
| ▸ | ELANE | P08246 | 1/20 | 0.31 |
| ▸ | HRH3 | Q9Y5N1 | 1/20 | 0.31 |
| ▸ | LTA4H | P09960 | 1/20 | 0.30 |
| ▸ | GAA | P10253 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL10754202 | 1.00 | KDM4E (0.33) | KDM4EHPGDTSHRALDH1A1MAPT | |
| SCHEMBL11848680 | 0.97 | — | — | |
| SCHEMBL23706664 | 0.92 | — | — | |
| SCHEMBL16915510 | 0.86 | — | — | |
| SCHEMBL198495 | 0.85 | TSHR (0.46) | HPGDTSHRALDH1A1MAPK1CYP1A2 | |
| SCHEMBL11840842 | 0.85 | TSHR (0.46) | HPGDTSHRALDH1A1MAPK1CYP1A2 | |
| SCHEMBL11836346 | 0.83 | LTA4H (0.41) | HPGDTSHRKMT2AMEN1LTA4H | |
| SCHEMBL677761 | 0.83 | LTA4H (0.41) | HPGDTSHRKMT2AMEN1LTA4H | |
| SCHEMBL7276666 | 0.83 | TSHR (0.34) | TSHRMAPTCYP1A2CYP2D6CYP2C19 | |
| SCHEMBL676923 | 0.81 | LTA4H (0.43) | HPGDTSHRKMT2AMEN1HRH3 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 51 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-3256448-A1 | SUBSTITUTED 1-CYCLOALKYL-2-OXOTETRAHYDROQUINOLIN-6-YL-SULFONAMIDES OR SALTS THEREOF AND USE THEREOF TO INCREASE STRESS TOLERANCE IN PLANTS | Bayer CropScience Aktiengesellschaft (DE) | 2017-12-20 | — | — | EP | claimed |
| WO-2016128365-A1 | SUBSTITUTED 1-CYCLOALKYL-2-OXOTETRAHYDROQUINOLIN-6-YL-SULFONAMIDES OR SALTS THEREOF AND USE THEREOF TO INCREASE STRESS TOLERANCE IN PLANTS | BAYER CROPSCIENCE AKTIENGESELLSCHAFT (DE) | 2016-08-18 | — | — | WO | claimed |
| US-7300741-B2 | For printing features having a dimension of about 30 nm or less; resist is developable in an aqueous alkaline developer | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2007-11-27 | — | — | US | claimed |
| US-20070269736-A1 | NEW SUB 40 NM RESOLUTION Si CONTAINING RESIST SYSTEM | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2007-11-22 | — | — | US | claimed |
| US-20070248908-A1 | ADVANCED CHEMICALLY AMPLIFIED RESIST FOR SUB 30NM DENSE FEATURE RESOLUTION | INTERNATIONAL BUSINESS MACHINES (US) | 2007-10-25 | — | — | US | claimed |
| US-20050106494-A1 | Silicon-containing resist systems with cyclic ketal protecting groups | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2005-05-19 | — | — | US | claimed |
| US-6043003-A | SOME OF THE POLAR FUNCTIONAL GROUPS OF THE AQUEOUS BASE SOLUBLE POLYMER OR COPOLYMERS ARE PROTECTED WITH A CYCLIC ALIPHATIC KETAL PROTECTING GROUP SUCH AS METHOXYCYCLOHEXANYL. | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2000-03-28 | — | — | US | claimed |
| US-6037097-A | A CYCLIC ALIPHATIC KETAL SUBSTITUENT E.G. METHOXYCYCLOHEXANYL AS AN ACID-LABILE PROTECTING GROUP FOR AN AQUEOUS BASE SOLUBLE POLYMER, E.G. A POLYHYDROXYSTYRENE; SHELF-LIFE; VACUUM STABILITY | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2000-03-14 | — | — | US | claimed |
| EP-0932082-A2 | Chemically amplified resist composition and method of creating a patterned resist using electron beam | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 1999-07-28 | — | — | EP | claimed |
| EP-3128841-A1 | USE OF SUBSTITUTED OXO TETRAHYDROQUINOLINE SULFONAMIDES OR SALTS THEREOF FOR RAISING STRESS TOLERANCE OF PLANTS | Bayer CropScience Aktiengesellschaft (DE) | 2017-02-15 | — | — | EP | disclosed |
| US-9519215-B2 | Composition of matter and molecular resist made therefrom | IRRESISTIBLE MATERIALS, LTD (GB) | 2016-12-13 | — | — | US | disclosed |
| US-20160246173-A1 | Composition of Matter and Molecular Resist Made Therefrom | IRRESISTIBLE MATERIALS LTD (GB) | 2016-08-25 | — | — | US | disclosed |
| US-9229322-B2 | Composition of matter and molecular resist made therefrom | IRRESISTIBLE MATERIALS LTD (GB) | 2016-01-05 | — | — | US | disclosed |
| WO-2015155154-A1 | USE OF SUBSTITUTED OXO TETRAHYDROQUINOLINE SULFONAMIDES OR SALTS THEREOF FOR RAISING STRESS TOLERANCE OF PLANTS | BAYER CROPSCIENCE AG (DE) | 2015-10-15 | — | — | WO | disclosed |
| CN-1009824-B | PROCESS FOR PRODUCTION OF N,N-DISUBSTD. CARBOXYLIC ACID AMIDES | TOKUNOYAMA SODA CORP (JP) | 1990-10-03 | — | — | CN | disclosed |
| EP-0189774-B1 | PROCESS FOR PRODUCTION OF N,N-DISUBSTITUTED CARBOXYLIC ACID AMIDES | TOKUYAMA SODA KABUSHIKI KAISHA (JP) | 1989-04-12 | — | — | EP | disclosed |
| EP-0189774-A1 | Process for production of N,N-disubstituted carboxylic acid amides | TOKUYAMA SODA KABUSHIKI KAISHA (JP) | 1986-08-06 | — | — | EP | disclosed |
| CN-86100282-A | N, the manufacture method of N-two generations carboxylic acyloxy amine | — | 1986-07-16 | — | — | CN | disclosed |
| US-4452943-A | ADDING NITRILE-CONTAINING MATERIAL TO NON-POLAR THERMOPLASTIC POLYMER | GOLDMAN CONRAD | 1984-06-05 | — | — | US | disclosed |
| US-3971825-A | (5,6) (10,11) BIS-METHYLENE, BRONCHODILATORS | SANKYO COMPANY LIMITED (JA) | 1976-07-27 | — | — | US | disclosed |