Predicted protein targets (top 14)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | LTA4H | P09960 | 3/20 | 0.41 |
| ▸ | TSHR | P16473 | 3/20 | 0.41 |
| ▸ | NR5A1 | Q13285 | 1/20 | 0.39 |
| ▸ | NPC1 | O15118 | 2/20 | 0.38 |
| ▸ | RAB9A | P51151 | 2/20 | 0.38 |
| ▸ | TP53 | P04637 | 2/20 | 0.37 |
| ▸ | HPGD | P15428 | 1/20 | 0.37 |
| ▸ | MEN1 | O00255 | 1/20 | 0.36 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.36 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.36 |
| ▸ | PLA2G2A | P14555 | 1/20 | 0.35 |
| ▸ | THRA | P10827 | 1/20 | 0.35 |
| ▸ | THRB | P10828 | 1/20 | 0.35 |
| ▸ | PLA2G4B | P0C869 | 1/20 | 0.34 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL11836346 | 1.00 | LTA4H (0.41) | LTA4HTSHRNR5A1NPC1RAB9A | |
| SCHEMBL27335030 | 0.98 | LTA4H (0.43) | LTA4HTSHRNR5A1NPC1RAB9A | |
| SCHEMBL676923 | 0.98 | LTA4H (0.43) | LTA4HTSHRNR5A1NPC1RAB9A | |
| SCHEMBL11840842 | 0.93 | TSHR (0.46) | LTA4HTSHRNR5A1HPGDMEN1 | |
| SCHEMBL198495 | 0.93 | TSHR (0.46) | LTA4HTSHRNR5A1HPGDMEN1 | |
| SCHEMBL7276666 | 0.85 | TSHR (0.34) | LTA4HTSHRMEN1KMT2ATHRB | |
| SCHEMBL10754202 | 0.83 | KDM4E (0.33) | LTA4HTSHRHPGDMEN1KMT2A | |
| SCHEMBL2899477 | 0.83 | KDM4E (0.33) | LTA4HTSHRHPGDMEN1KMT2A | |
| SCHEMBL11848680 | 0.80 | — | — | |
| SCHEMBL4353384 | 0.80 | NR5A1 (0.38) | LTA4HTSHRNR5A1NPC1RAB9A |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 35 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-9090722-B2 | Chemical amplification resist composition, and mold preparation method and resist film using the same | FUJIFILM CORPORATION (JP) | 2015-07-28 | — | — | US | disclosed |
| EP-1367439-B1 | Radiation-sensitive composition | FUJIFILM CORP (JP) | 2012-08-01 | — | — | EP | disclosed |
| US-20120006788-A1 | CHEMICAL AMPLIFICATION RESIST COMPOSITION, AND MOLD PREPARATION METHOD AND RESIST FILM USING THE SAME | FUJIFILM CORPORATION (JP) | 2012-01-12 | — | — | US | disclosed |
| EP-2399168-A1 | CHEMICAL AMPLIFICATION RESIST COMPOSITION, AND MOLD PREPARATION METHOD AND RESIST FILM USING THE SAME | FUJIFILM Corporation (JP) | 2011-12-28 | — | — | EP | disclosed |
| WO-2010150917-A1 | CHEMICAL AMPLIFICATION RESIST COMPOSITION, AND MOLD PREPARATION METHOD AND RESIST FILM USING THE SAME | FUJIFILM CORPORATION (JP) | 2010-12-29 | — | — | WO | disclosed |
| EP-1467251-B1 | Positive resist composition | FUJIFILM CORP (JP) | 2010-09-08 | — | — | EP | disclosed |
| US-20080096130-A1 | POSITIVE RESIST COMPOSITION | FUJIFILM CORPORATION | 2008-04-24 | — | — | US | disclosed |
| US-7361446-B2 | Sensitivity, high resolution, good pattern profile, used for super-microlithography | FUJIFILM CORPORATION (JP) | 2008-04-22 | — | — | US | disclosed |
| US-7282316-B2 | Sulfonyldiazomethane compounds, photoacid generator, resist materials and patterning using the same | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2007-10-16 | — | — | US | disclosed |
| US-7250246-B2 | Positive resist composition and pattern formation method using the same | FUJIFILM CORPORATION (JP) | 2007-07-31 | — | — | US | disclosed |
| US-20030108811-A1 | Positive resist composition | FUJI PHOTO FILM CO., LTD. | 2003-06-12 | — | — | US | disclosed |
| US-20020012866-A1 | Positive photoresist composition | FUJIFILM CORPORATION (JP) | 2002-01-31 | — | — | US | disclosed |
| EP-0652261-B1 | Dichroic azo dye, liquid crystal composition containing the same, and liquid crystal element using the composition | MITSUBISHI CHEM CORP (JP) | 2001-06-13 | — | — | EP | disclosed |
| US-6207343-B1 | RESIN CONTAINING GROUPS WHICH DECOMPOSE BY THE ACTION OF AN ACID TO ENHANCE ITS SOLUBILITY IN AN ALKALINE DEVELOPING SOLUTION AND A COMPOUND WHICH GENERATES AN ACID UPON IRRADIATION WITH ACTINIC RAYS OR RADIATION | FUJI PHOTO FILM CO., LTD. (JP) | 2001-03-27 | — | — | US | disclosed |
| EP-0787783-B1 | DICHROIC DYES, LIQUID-CRYSTAL COMPOSITION CONTAINING THE SAME, AND LIQUID-CRYSTAL DISPLAY ELEMENT | MITSUBISHI CHEM CORP (JP) | 2000-04-05 | — | — | EP | disclosed |
| US-5789556-A | TETRAKISAZO DYES | MITSUBISHI CHEMICAL CORPORATION (JP) | 1998-08-04 | — | — | US | disclosed |
| EP-0787783-A1 | DICHROIC DYES, LIQUID-CRYSTAL COMPOSITION CONTAINING THE SAME, AND LIQUID-CRYSTAL DISPLAY ELEMENT | MITSUBISHI CHEMICAL CORPORATION (JP) | 1997-08-06 | — | — | EP | disclosed |
| US-5536818-A | Dichroic azo dye, liquid crystal composition containing the same, and liquid crystal element using the composition | MITSUBISHI CHEMICAL CORPORATION (JP) | 1996-07-16 | — | — | US | disclosed |
| EP-0652261-A1 | Dichroic azo dye, liquid crystal composition containing the same, and liquid crystal element using the composition | MITSUBISHI CHEMICAL CORPORATION (JP) | 1995-05-10 | — | — | EP | disclosed |
| US-3971825-A | (5,6) (10,11) BIS-METHYLENE, BRONCHODILATORS | SANKYO COMPANY LIMITED (JA) | 1976-07-27 | — | — | US | disclosed |