Predicted protein targets (top 11)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | CES2 | O00748 | 1/20 | 0.35 |
| ▸ | CES1 | P23141 | 1/20 | 0.35 |
| ▸ | HDAC3 | O15379 | 4/20 | 0.33 |
| ▸ | HDAC1 | Q13547 | 4/20 | 0.33 |
| ▸ | HDAC2 | Q92769 | 4/20 | 0.33 |
| ▸ | HDAC8 | Q9BY41 | 4/20 | 0.33 |
| ▸ | FFAR3 | O14843 | 3/20 | 0.33 |
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.32 |
| ▸ | TSHR | P16473 | 1/20 | 0.32 |
| ▸ | CYP2C9 | P11712 | 1/20 | 0.32 |
| ▸ | HDAC6 | Q9UBN7 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL10356558 | 0.81 | CES2 (0.33) | CES2CES1HDAC3HDAC1HDAC2 | |
| SCHEMBL876069 | 0.80 | HDAC3 (0.40) | CES2CES1HDAC3HDAC1HDAC2 | |
| SCHEMBL423119 | 0.78 | CES2 (0.35) | CES2CES1HDAC3HDAC1HDAC2 | |
| Hydrochloric Acid SCHEMBL27592323 | 0.77 | CES2 (0.33) | CES2CES1HDAC3HDAC1HDAC2 | |
| Chloromethane SCHEMBL5007039 | 0.75 | TSHR (0.34) | CES2CES1HDAC3HDAC1HDAC2 | |
| SCHEMBL17156138 | 0.75 | CYP2C9 (0.37) | CES2CES1HDAC3HDAC1HDAC2 | |
| SCHEMBL17156139 | 0.75 | CYP2C9 (0.37) | CES2CES1HDAC3HDAC1HDAC2 | |
| SCHEMBL5901415 | 0.74 | CYP2C9 (0.51) | ALDH1A1TSHRCYP2C9 | |
| SCHEMBL5901419 | 0.74 | CYP2C9 (0.51) | ALDH1A1TSHRCYP2C9 | |
| Sulfuric Acid SCHEMBL27573794 | 0.72 | CES2 (0.30) | CES2CES1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 8 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20100203456-A1 | METHOD OF FORMING RESIST PATTERN AND METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE | RENESAS TECHNOLOGY CORP. (JP) | 2010-08-12 | — | — | US | disclosed |
| US-7727709-B2 | Method of forming resist pattern and method of manufacturing semiconductor device | RENESAS TECHNOLOGY CORP. (JP) | 2010-06-01 | — | — | US | disclosed |
| US-20070224546-A1 | Method of forming resist pattern and method of maufacturing semiconductor device | RENESAS TECHNOLOGY CORP. | 2007-09-27 | — | — | US | disclosed |
| EP-1476530-A1 | ANTIFOULING DETERGENT FOR HARD SURFACES | Kao Corporation (JP) | 2004-11-17 | — | — | EP | disclosed |
| WO-2003070867-A1 | ANTIFOULING DETERGENT FOR HARD SURFACES | KAO CORPORATION (JP) | 2003-08-28 | — | — | WO | disclosed |
| EP-0233588-B1 | A COLD ROLLING OIL COMPOSITION FOR ALUMINIUM AND ALUMINIUM-CONTAINING ALLOYS | Kao Corporation (JP) | 1990-09-19 | — | — | EP | disclosed |
| US-4800034-A | HIGHER FATTY ACIDS AND ALCOHOLS AS LUBRICANTS; WATER SOLUBLE CATIONIC AND AMPHOTERIC POLYMERS AS DISPERSANTS | KAO CORPORATION (JP) | 1989-01-24 | — | — | US | disclosed |
| EP-0233588-A1 | A cold rolling oil composition for aluminium and aluminium-containing alloys | Kao Corporation (JP) | 1987-08-26 | — | — | EP | disclosed |