SCHEMBL29010206

SCHEMBL29010206

CCCCCCCCCC(=O)NC(=O)c1ccc(C(N)=O)cc1

nearest known ligand 0.55

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
▸ GAA P10253 1/20 0.55
▸ ALDH1A1 P00352 4/20 0.50
▸ POLB P06746 1/20 0.50
▸ LMNA P02545 2/20 0.49
▸ KDM4E B2RXH2 2/20 0.49
▸ KMT2A Q03164 2/20 0.49
▸ HSP90AA1 P07900 2/20 0.49
▸ MEN1 O00255 1/20 0.49
▸ APAF1 O14727 1/20 0.49
▸ RGS12 O14924 1/20 0.49
▸ MAPK1 P28482 1/20 0.49
▸ MAPT P10636 3/20 0.48
▸ CRHBP P24387 2/20 0.48
▸ CRHR2 Q13324 2/20 0.48
▸ SMN1; SMN2 Q16637 2/20 0.48
▸ SCN5A Q14524 1/20 0.47
▸ SCN2A Q99250 1/20 0.47
▸ HTT P42858 1/20 0.46
▸ L3MBTL1 Q9Y468 1/20 0.45
▸ HSD17B3 P37058 5/20 0.45

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL7270333 0.86 HSD17B3 (0.63) GAAALDH1A1POLBLMNAKDM4E
SCHEMBL7264292 0.86 HSD17B3 (0.63) GAAALDH1A1POLBLMNAKDM4E
SCHEMBL7270302 0.86 HSD17B3 (0.63) GAAALDH1A1POLBLMNAKDM4E
SCHEMBL7271443 0.86 HSD17B3 (0.63) GAAALDH1A1POLBLMNAKDM4E
SCHEMBL7262830 0.86 HSD17B3 (0.63) GAAALDH1A1POLBLMNAKDM4E
SCHEMBL7264212 0.86 HSD17B3 (0.63) GAAALDH1A1POLBLMNAKDM4E
SCHEMBL7268928 0.86 HSD17B3 (0.63) GAAALDH1A1POLBLMNAKDM4E
SCHEMBL7264136 0.86 HSD17B3 (0.63) GAAALDH1A1POLBLMNAKDM4E
SCHEMBL7271166 0.86 HSD17B3 (0.63) GAAALDH1A1POLBLMNAKDM4E
SCHEMBL21615871 0.84 NAAA (0.61) GAAALDH1A1POLBKMT2AMEN1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-112226081-B Laser sensitization resin composition, preparation method and application thereof 中国石油化工股份有限公司 2023-05-02 — — CN disclosed
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