Predicted protein targets (top 16)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ALDH1A1 | P00352 | 3/20 | 0.40 |
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.40 |
| ▸ | PDE4B | Q07343 | 1/20 | 0.37 |
| ▸ | TNK2 | Q07912 | 2/20 | 0.34 |
| ▸ | MEN1 | O00255 | 1/20 | 0.33 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.33 |
| ▸ | DHFR | P00374 | 1/20 | 0.32 |
| ▸ | HSD11B1 | P28845 | 1/20 | 0.32 |
| ▸ | HPGD | P15428 | 2/20 | 0.31 |
| ▸ | POLB | P06746 | 1/20 | 0.31 |
| ▸ | PTPN1 | P18031 | 1/20 | 0.31 |
| ▸ | CHRNB2 | P17787 | 1/20 | 0.31 |
| ▸ | CHRNB4 | P30926 | 1/20 | 0.31 |
| ▸ | CHRNA3 | P32297 | 1/20 | 0.31 |
| ▸ | CHRNA7 | P36544 | 1/20 | 0.31 |
| ▸ | CHRNA4 | P43681 | 1/20 | 0.31 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL412542 | 0.95 | ALDH1A1 (0.39) | ALDH1A1KDM4EPDE4BTNK2MEN1 | |
| 4-Vinylphenol SCHEMBL8767532 | 0.88 | PTPN1 (0.41) | ALDH1A1KDM4ETNK2MEN1KMT2A | |
| SCHEMBL8527580 | 0.83 | PDE4B (0.34) | PDE4BDHFRPTPN1 | |
| SCHEMBL7929464 | 0.83 | ALDH1A1 (0.60) | ALDH1A1KDM4EPDE4BTNK2MEN1 | |
| SCHEMBL5942305 | 0.81 | DHFR (0.41) | ALDH1A1KDM4EPDE4BDHFRHSD11B1 | |
| SCHEMBL3500438 | 0.80 | TNK2 (0.44) | ALDH1A1KDM4ETNK2MEN1KMT2A | |
| SCHEMBL8528712 | 0.80 | PDE4B (0.50) | ALDH1A1KDM4EPDE4BHPGDPTPN1 | |
| SCHEMBL9876349 | 0.79 | KDM4E (0.39) | ALDH1A1KDM4EPDE4BTNK2MEN1 | |
| SCHEMBL2768829 | 0.79 | DHFR (0.36) | PDE4BTNK2MEN1KMT2ADHFR | |
| SCHEMBL863095 | 0.79 | ALDH1A1 (0.58) | ALDH1A1KDM4EPDE4BTNK2MEN1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 60 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-110383170-B | Method for producing plated molded article | JSR株式会社 | 2023-10-03 | — | — | CN | disclosed |
| US-11249398-B2 | Method for producing plated shaped structure and photosensitive resin composition for production of plated shaped structures | JSR CORPORATION (JP) | 2022-02-15 | — | — | US | disclosed |
| CN-113474728-A | Method for manufacturing substrate with pattern, method for manufacturing circuit substrate, method for manufacturing touch panel, and laminate | 富士胶片株式会社 | 2021-10-01 | — | — | CN | disclosed |
| US-10913873-B2 | Block copolymers with high flory-huggins interaction parameters for block copolymer lithography | WISCONSIN ALUMNI RESEARCH FOUNDATION (US) | 2021-02-09 | — | — | US | disclosed |
| US-10913873-B2 | Block copolymers with high flory-huggins interaction parameters for block copolymer lithography | WISCONSIN ALUMNI RESEARCH FOUNDATION (US) | 2021-02-09 | — | — | US | disclosed |
| US-20170121555-A1 | BLOCK COPOLYMERS WITH HIGH FLORY-HUGGINS INTERACTION PARAMETERS FOR BLOCK COPOLYMER LITHOGRAPHY | WISCONSIN ALUMNI RESEARCH FOUNDATION | 2017-05-04 | — | — | US | disclosed |
| US-20170121555-A1 | BLOCK COPOLYMERS WITH HIGH FLORY-HUGGINS INTERACTION PARAMETERS FOR BLOCK COPOLYMER LITHOGRAPHY | WISCONSIN ALUMNI RESEARCH FOUNDATION | 2017-05-04 | — | — | US | disclosed |
| US-20170121555-A1 | BLOCK COPOLYMERS WITH HIGH FLORY-HUGGINS INTERACTION PARAMETERS FOR BLOCK COPOLYMER LITHOGRAPHY | WISCONSIN ALUMNI RESEARCH FOUNDATION | 2017-05-04 | — | — | US | disclosed |
| US-9640396-B2 | Spin-on spacer materials for double- and triple-patterning lithography | BREWER SCIENCE INC. (US) | 2017-05-02 | — | — | US | disclosed |
| US-9640396-B2 | Spin-on spacer materials for double- and triple-patterning lithography | BREWER SCIENCE INC. (US) | 2017-05-02 | — | — | US | disclosed |
| US-5558971-A | HYDROXYSTYRENE POLYMER DERIVATIVES, PHOTOACID GENERATOR | WAKO PURE CHEMICAL INDUSTRIES, LTD. (JP) | 1996-09-24 | — | — | US | disclosed |
| US-5558976-A | HYDROXYSTYRENE POLYMER DERIVATIVES, PHOTOACID GENERATOR, PHOTORESISTS | WAKO PURE CHEMICAL INDUSTRIES, LTD. (JP) | 1996-09-24 | — | — | US | disclosed |
| US-5558978-A | Photoresist compositions containing copolymers having acid-labile groups and recurring units derived from either N-(hydroxymethyl)maleimide or N-(acetoxymethyl)maleimide or both | OCG MICROELECTRONIC MATERIALS, INC. (US) | 1996-09-24 | — | — | US | disclosed |
| EP-0704762-A1 | Resist material and pattern formation | WAKO PURE CHEMICAL INDUSTRIES LTD (JP) | 1996-04-03 | — | — | EP | disclosed |
| EP-0659781-A2 | Copolymers of maleimide, for photoresists | OCG Microelectronic Materials Inc. (US) | 1995-06-28 | — | — | EP | disclosed |
| US-5397680-A | Light sensitive elements with maleimide monomers and styrene derivatives polymers | CIBA-GEIGY AG (CH) | 1995-03-14 | — | — | US | disclosed |
| US-5369200-A | Positive photoresist having improved processing properties | CIBA-GEIGY AG (CH) | 1994-11-29 | — | — | US | disclosed |
| US-5352564-A | Copolymer of styrene derivatives, an acid release agent and a dissolution inhibitor containing an unstable acid group | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 1994-10-04 | — | — | US | disclosed |
| EP-0601974-A1 | Positive photoresist with better properties | OCG Microelectronic Materials Inc. (US) | 1994-06-15 | — | — | EP | disclosed |
| EP-0476865-A1 | Resist material and process for forming pattern using the same | WAKO PURE CHEMICAL INDUSTRIES LTD (JP) | 1992-03-25 | — | — | EP | disclosed |