SCHEMBL2901524

SCHEMBL2901524

CCCCCCCC/C=C\CCCCCCCCC(CCCCCCCCCCCCCCC)OC(CCCCCCCC/C=C\CCCCCCCC)CCCCCCCCCCCCCCC

nearest known ligand 0.53

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
FAAH O00519 2/20 0.50
TRPV1 Q8NER1 1/20 0.50
ALDH1A1 P00352 1/20 0.44
CNR1 P21554 1/20 0.44
CNR2 P34972 1/20 0.44
GMNN O75496 1/20 0.44
USP2 O75604 1/20 0.44
LMNA P02545 1/20 0.44
CYP1A2 P05177 1/20 0.44
POLB P06746 1/20 0.44
MAPT P10636 1/20 0.44
CYP2C9 P11712 1/20 0.44
ALOX15 P16050 1/20 0.44
APEX1 P27695 1/20 0.44
CYP2C19 P33261 1/20 0.44
RECQL P46063 1/20 0.44
BLM P54132 1/20 0.44
NPSR1 Q6W5P4 1/20 0.44
HSD17B10 Q99714 1/20 0.44
DUSP3 P51452 1/20 0.44

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL13571362 1.00 FAAH (0.50) FAAHTRPV1ALDH1A1CNR1CNR2
SCHEMBL8431397 1.00 FAAH (0.50) FAAHTRPV1ALDH1A1CNR1CNR2
SCHEMBL9751428 1.00 FAAH (0.50) FAAHTRPV1ALDH1A1CNR1CNR2
SCHEMBL1311557 0.96 FAAH (0.47) FAAHTRPV1ALDH1A1CNR1CNR2
SCHEMBL9579092 0.96 FAAH (0.47) FAAHTRPV1ALDH1A1CNR1CNR2
SCHEMBL15082660 0.96 FAAH (0.47) FAAHTRPV1ALDH1A1CNR1CNR2
SCHEMBL25421262 0.94 FAAH (0.45) FAAHTRPV1ALDH1A1CNR1CNR2
SCHEMBL7461147 0.94 FAAH (0.48) FAAHTRPV1ALDH1A1CNR1CNR2
SCHEMBL15082659 0.92 FFAR1 (0.46) FAAHTRPV1ALDH1A1CNR1CNR2
SCHEMBL251871 0.91 ALDH1A1 (0.46) FAAHTRPV1ALDH1A1CNR1CNR2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 18 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20240018286-A1 FINE RESIN PARTICLE AND APPLICATION THEREOF SEKISUI KASEI CO., LTD. (JP) 2024-01-18 US disclosed
EP-4265658-A1 RESIN FINE PARTICLES AND APPLICATION THEREOF Sekisui Kasei Co., Ltd. (JP) 2023-10-25 EP disclosed
CN-115836052-A Topical formulations of (1S) -1-phenyl-2-pyridin-2-ylethylamine 拜尔哈文制药股份有限公司 2023-03-21 CN disclosed
EP-3443951-B1 SUPERFATTING AGENT AND PERSONAL CARE COMPOSITION SABO SPA (IT) 2022-09-21 EP disclosed
EP-3613720-B1 WATER ABSORPTION PREVENTING MATERIAL FOR INORGANIC POROUS MATERIAL, METHOD FOR MODIFYING CONCRETE, AND CONCRETE DOW TORAY CO LTD (JP) 2022-08-03 EP disclosed
WO-2022131052-A1 RESIN FINE PARTICLES AND APPLICATION THEREOF 積水化成品工業株式会社 2022-06-23 WO disclosed
US-11351110-B2 Silicone-free cosmetic compositions Thomas, Kirsten Elizabeth (US) 2022-06-07 US disclosed
US-20220125935-A1 COMPOSITION FOR PREVENTING OR TREATING ATOPIC DERMATITIS COMPRISING SKIN-PENETRATING NUCLEIC ACID COMPLEX AS EFFECTIVE COMPONENT SEASUN THERAPEUTICS (KR) 2022-04-28 US disclosed
US-9777251-B2 Liquid composition for removing titanium nitride, semiconductor-element cleaning method using same, and semiconductor-element manufacturing method MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2017-10-03 US disclosed
US-20160281038-A1 LIQUID COMPOSITION FOR REMOVING TITANIUM NITRIDE, SEMICONDUCTOR-ELEMENT CLEANING METHOD USING SAME, AND SEMICONDUCTOR-ELEMENT MANUFACTURING METHOD MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2016-09-29 US disclosed
EP-1342777-B9 Substrate cleaning liquid media and cleaning method MITSUBISHI CHEM CORP (JP) 2010-02-17 EP disclosed
EP-1342777-B1 Substrate cleaning liquid media and cleaning method MITSUBISHI CHEM CORP (JP) 2009-08-19 EP disclosed
EP-1811949-A1 TOPICAL SLIMMING PREPARATION AND A COSMETIC CONTAINING A CARNITINE DERIVATIVE SHOWA DENKO KABUSHIKI KAISHA (JP) 2007-08-01 EP disclosed
US-7235516-B2 For use in semiconductor devices, display devices; for efficiently removing contaminant particles (fine particles) present on a substrate MITSUBISHI CHEMICAL CORPORATION (JP) 2007-06-26 US disclosed
US-20070135322-A1 SUBSTRATE SURFACE CLEANING LIQUID MEDIUM AND CLEANING METHOD MITSUBISHI CHEMICAL CORPORATION (JP) 2007-06-14 US disclosed
WO-2005115326-A1 TOPICAL SLIMMING PREPARATION AND A COSMETIC CONTAINING A CARNITINE DERIVATIVE SHOWA DENKO K.K. (JP) 2005-12-08 WO disclosed
EP-1342777-A1 Substrate cleaning liquid media and cleaning method MITSUBISHI CHEMICAL CORPORATION (JP) 2003-09-10 EP disclosed
US-20030144163-A1 Substrate surface cleaning liquid mediums and cleaning method MITSUBISHI CHEMICAL CORPORATION (JP) 2003-07-31 US disclosed