Predicted protein targets (top 8)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | CYP1A2 | P05177 | 1/20 | 0.37 |
| ▸ | CNR1 | P21554 | 5/20 | 0.33 |
| ▸ | CNR2 | P34972 | 5/20 | 0.33 |
| ▸ | NAAA | Q02083 | 2/20 | 0.32 |
| ▸ | TSHR | P16473 | 1/20 | 0.32 |
| ▸ | METAP2 | P50579 | 1/20 | 0.31 |
| ▸ | EPHX1 | P07099 | 8/20 | 0.31 |
| ▸ | EPHX2 | P34913 | 2/20 | 0.31 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL25189054 | 0.86 | NAAA (0.38) | CYP1A2CNR1CNR2NAAAEPHX1 | |
| SCHEMBL7634962 | 0.86 | NAAA (0.38) | CYP1A2CNR1CNR2NAAAEPHX1 | |
| SCHEMBL25190381 | 0.86 | NAAA (0.38) | CYP1A2CNR1CNR2NAAAEPHX1 | |
| SCHEMBL8976887 | 0.84 | CNR1 (0.36) | CYP1A2CNR1CNR2NAAAEPHX1 | |
| SCHEMBL526129 | 0.84 | CNR1 (0.36) | CYP1A2CNR1CNR2NAAAEPHX1 | |
| SCHEMBL3697771 | 0.84 | CYP1A2 (0.38) | CYP1A2CNR1CNR2NAAAEPHX1 | |
| SCHEMBL29022693 | 0.81 | CYP1A2 (0.31) | CYP1A2 | |
| SCHEMBL28295567 | 0.80 | CYP1A2 (0.34) | CYP1A2CNR1CNR2TSHR | |
| SCHEMBL29008540 | 0.79 | — | — | |
| SCHEMBL969004 | 0.79 | CYP1A2 (0.39) | CYP1A2CNR1CNR2NAAAEPHX1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-112526822-B | Composition for forming silicon-containing resist underlayer film and pattern forming method | 信越化学工业株式会社 | 2025-02-28 | — | — | CN | disclosed |
| CN-112286000-B | Composition for forming silicon-containing resist underlayer film and pattern forming method | 信越化学工业株式会社 | 2024-12-03 | — | — | CN | disclosed |
| CN-111856882-B | Composition for forming silicon-containing resist underlayer film and pattern forming method | 信越化学工业株式会社 | 2024-11-29 | — | — | CN | disclosed |
| CN-114660896-B | Composition for forming silicon-containing resist underlayer film, pattern forming method, and silicon compound | 信越化学工业株式会社 | 2024-06-11 | — | — | CN | disclosed |
| CN-108473684-B | Process for producing siloxane polymer | 东丽精细化工株式会社 | 2023-05-12 | — | — | CN | disclosed |