Predicted protein targets (top 1)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | CYP1A2 | P05177 | 1/20 | 0.31 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL29008540 | 0.98 | — | — | |
| SCHEMBL19816528 | 0.83 | — | — | |
| SCHEMBL10009523 | 0.82 | SHBG (0.31) | CYP1A2 | |
| SCHEMBL204720 | 0.82 | SHBG (0.31) | CYP1A2 | |
| SCHEMBL29022696 | 0.81 | CYP1A2 (0.37) | CYP1A2 | |
| SCHEMBL236254 | 0.80 | — | — | |
| SCHEMBL965620 | 0.76 | — | — | |
| SCHEMBL27485943 | 0.76 | LMNA (0.34) | CYP1A2 | |
| SCHEMBL21295482 | 0.76 | CYP1A2 (0.34) | CYP1A2 | |
| SCHEMBL6697782 | 0.75 | CYP1A2 (0.32) | CYP1A2 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 9 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-120020643-A | Pattern forming method | 信越化学工业株式会社 | 2025-05-20 | — | — | CN | disclosed |
| CN-112526822-B | Composition for forming silicon-containing resist underlayer film and pattern forming method | 信越化学工业株式会社 | 2025-02-28 | — | — | CN | disclosed |
| CN-112286000-B | Composition for forming silicon-containing resist underlayer film and pattern forming method | 信越化学工业株式会社 | 2024-12-03 | — | — | CN | disclosed |
| CN-111856882-B | Composition for forming silicon-containing resist underlayer film and pattern forming method | 信越化学工业株式会社 | 2024-11-29 | — | — | CN | disclosed |
| CN-118620392-A | Composition for forming silicon-containing resist underlayer film and pattern forming method | 信越化学工业株式会社 | 2024-09-10 | — | — | CN | disclosed |
| CN-114660896-B | Composition for forming silicon-containing resist underlayer film, pattern forming method, and silicon compound | 信越化学工业株式会社 | 2024-06-11 | — | — | CN | disclosed |
| CN-116804825-A | Composition for forming silicon-containing metal hard mask and pattern forming method | 信越化学工业株式会社 | 2023-09-26 | — | — | CN | disclosed |
| CN-111458980-B | Composition for forming underlayer film of silicon-containing resist and method for forming pattern | 信越化学工业株式会社 | 2023-08-11 | — | — | CN | disclosed |
| CN-108473684-B | Process for producing siloxane polymer | 东丽精细化工株式会社 | 2023-05-12 | — | — | CN | disclosed |