SCHEMBL29028293

SCHEMBL29028293

CC=CC(=O)OC(CCC)CCOc1ccc(C2(c3ccc(OCCC(CCC)OC(=O)C=CC)cc3)Cc3ccccc3C2)cc1

nearest known ligand 0.34

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
TSHR P16473 2/20 0.34
MEN1 O00255 1/20 0.34
KMT2A Q03164 1/20 0.34
ALDH1A1 P00352 2/20 0.34
MAPT P10636 2/20 0.34
POLB P06746 1/20 0.34
HPGD P15428 1/20 0.34
NAMPT P43490 1/20 0.32
ACACB O00763 1/20 0.32
PPARG P37231 3/20 0.32
ALOX5 P09917 2/20 0.32
PPARA Q07869 2/20 0.32
GBA1 P04062 1/20 0.32
PPARD Q03181 1/20 0.31
PTGES O14684 1/20 0.31
TDP1 Q9NUW8 1/20 0.31
LMNA P02545 1/20 0.31
CYP1A2 P05177 1/20 0.31
CYP3A4 P08684 1/20 0.31
CYP2D6 P10635 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL29028231 0.84 CHRNA7 (0.37) TSHRMEN1KMT2AALDH1A1MAPT
SCHEMBL29028230 0.82 MEN1 (0.35) TSHRMEN1KMT2AMAPTPOLB
SCHEMBL21829160 0.79 THRB (0.37) TSHRMEN1KMT2AALDH1A1MAPT
SCHEMBL21829181 0.76 KMT2A (0.38) MEN1KMT2AALDH1A1MAPTPOLB
SCHEMBL29028234 0.74 THRB (0.40) TSHRMEN1KMT2AALDH1A1MAPT
SCHEMBL22493945 0.73 TDP1 (0.37) TSHRMEN1KMT2AALDH1A1MAPT
SCHEMBL21829171 0.69 MEN1 (0.40) TSHRMEN1KMT2APOLBPPARA
SCHEMBL20492127 0.68 ALDH1A1 (0.53) TSHRMEN1KMT2AALDH1A1CYP3A4
SCHEMBL28407215 0.68 THRB (0.36) MEN1KMT2AMAPTACACBLMNA
SCHEMBL20492159 0.67 ALDH1A1 (0.43) TSHRMEN1KMT2AALDH1A1LMNA

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-110392864-B Negative photosensitive resin composition, cured film, element and organic EL display having cured film, and method for producing same 东丽株式会社 2023-05-23 CN disclosed