⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL9842449 | 0.67 | — | — | |
| SCHEMBL10448804 | 0.66 | GAA (0.35) | — | |
| SCHEMBL14689964 | 0.64 | THRB (0.33) | — | |
| SCHEMBL15057472 | 0.64 | KDM1A (0.31) | — | |
| SCHEMBL11520353 | 0.61 | GAA (0.36) | — | |
| SCHEMBL30387554 | 0.60 | DPP4 (0.32) | — | |
| SCHEMBL11386965 | 0.59 | — | — | |
| SCHEMBL6547319 | 0.59 | — | — | |
| SCHEMBL21224108 | 0.58 | HTT (0.37) | — | |
| SCHEMBL7364601 | 0.58 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 7 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-117999296-A | Composition and photosensitive composition | 东京应化工业株式会社 | 2024-05-07 | — | — | CN | disclosed |
| CN-117980346-A | Composition and photosensitive composition | 东京应化工业株式会社 | 2024-05-03 | — | — | CN | disclosed |
| CN-117908327-A | Composition and photosensitive composition | 东京应化工业株式会社 | 2024-04-19 | — | — | CN | disclosed |
| CN-117908326-A | Photosensitive composition | 东京应化工业株式会社 | 2024-04-19 | — | — | CN | disclosed |
| CN-108957956-B | Curable composition, cured product, cured film, display panel, and method for producing cured product | 东京应化工业株式会社 | 2024-04-02 | — | — | CN | disclosed |
| CN-117178001-A | Photocurable composition | 东京应化工业株式会社 | 2023-12-05 | — | — | CN | disclosed |
| CN-116515023-A | Composition and cured product | 东京应化工业株式会社 | 2023-08-01 | — | — | CN | disclosed |