Predicted protein targets (top 5)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | TSHR | P16473 | 2/20 | 0.43 |
| ▸ | MAPK1 | P28482 | 1/20 | 0.43 |
| ▸ | ALDH1A1 | P00352 | 4/20 | 0.41 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.38 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.36 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL7218169 | 0.81 | TSHR (0.42) | TSHRMAPK1ALDH1A1SMN1; SMN2TDP1 | |
| SCHEMBL29223034 | 0.74 | — | — | |
| SCHEMBL49463 | 0.73 | ALDH1A1 (0.52) | TSHRMAPK1ALDH1A1SMN1; SMN2TDP1 | |
| SCHEMBL9541696 | 0.73 | ALDH1A1 (0.52) | TSHRMAPK1ALDH1A1SMN1; SMN2TDP1 | |
| SCHEMBL17845184 | 0.73 | — | — | |
| SCHEMBL30020 | 0.73 | — | — | |
| SCHEMBL756278 | 0.72 | ALDH1A1 (0.47) | TSHRMAPK1ALDH1A1SMN1; SMN2TDP1 | |
| SCHEMBL16944227 | 0.71 | TSHR (0.48) | TSHRMAPK1ALDH1A1SMN1; SMN2TDP1 | |
| SCHEMBL16610578 | 0.71 | TSHR (0.59) | TSHRMAPK1ALDH1A1SMN1; SMN2TDP1 | |
| SCHEMBL17151206 | 0.70 | ALDH1A1 (0.47) | TSHRMAPK1ALDH1A1SMN1; SMN2TDP1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-117940849-A | Wafer edge protection film forming composition for semiconductor manufacturing | 日产化学株式会社 | 2024-04-26 | — | — | CN | disclosed |
| CN-117396810-A | Composition for forming silicon-containing resist underlayer film | 日产化学株式会社 | 2024-01-12 | — | — | CN | disclosed |
| CN-117083570-A | Composition for forming silicon-containing resist underlayer film | 日产化学株式会社 | 2023-11-17 | — | — | CN | disclosed |
| CN-116547343-A | Composition for forming silicon-containing resist underlayer film | 日产化学株式会社 | 2023-08-04 | — | — | CN | disclosed |